首页> 外文期刊>Applied Surface Science >Silicon isotope fractionation during FZ growth of silicon crystals
【24h】

Silicon isotope fractionation during FZ growth of silicon crystals

机译:硅晶体FZ生长过程中的硅同位素分馏

获取原文
获取原文并翻译 | 示例

摘要

We have carried out evaporation and crystal growth experiments, and precisely determined silicon isotopic ratios for the run products of the experiments using the ims-1270 SIMS with multicollectors at the Geological Survey of Japan. The silicon isotope fractionation factor between vapor and melt under vacuum was determined to be 0.9821 at a temperature of 1680 ℃, while that under 10~5 Pa of Ar was 0.9947. The SIMS microanalysis revealed isotopic zoning in a single silicon crystal which was produced during its growth. It is inferred that the silicon isotopic ratios in a silicon crystal during the floating zone growth were controlled by the growth conditions such as the growth and rotation rates as well as the fractionation factor between the crystal and its melt.
机译:我们已经进行了蒸发和晶体生长实验,并在日本地质调查局使用具有多个收集器的ims-1270 SIMS精确确定了实验运行产物的硅同位素比。在1680℃的温度下,蒸气与熔体之间的硅同位素分馏系数为0.9821,而在10〜5 Pa下的Ar为0.9947。 SIMS微分析显示了在其生长过程中产生的单个硅晶体中的同位素分区。可以推断,在浮区生长过程中,硅晶体中的硅同位素比率受生长条件(如生长和旋转速度以及晶体与其熔体之间的分馏因子)控制。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号