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Memory switching of germanium tellurium amorphous semiconductor

机译:锗碲非晶半导体的存储器开关

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The dc conductivity and switching properties of amorphous GeTe thin film of thickness 262 nm are investigated in the temperature range 303-373 K. The activation energy Delta E sigma, the room temperature electrical conductivity sigma(RT) and the pre-exponential factor sigma(0) were measured and validated for the tested sample. The conduction activation energy Delta E-sigma, is calculated. The I-V characteristic curves of the thin film samples showing a memory switching at the turnover point (TOP) from high resistance state (OFF state) to the negative differential resistance state (NDRS) (ON state). It is found that the mean values of the threshold electrical field E-th decreased exponentially with increasing temperatures in the investigated range. The switching activation energy Delta E-th is calculated. Measurements of the dissipated threshold power P-th and the threshold resistance R-th were carried out at TOP point at different temperatures of the samples. The activation energies Delta E-R and Delta E-p caused by resistance and power respectively are deduced. The results obtained support thermal model for initiating switching process in this system. (c) 2006 Elsevier B.V. All rights reserved.
机译:在303-373 K的温度范围内研究了厚度为262 nm的非晶GeTe薄膜的直流电导率和开关特性。活化能Delta E sigma,室温电导率sigma(RT)和预指数因子sigma( 0)被测样品并进行了验证。计算出传导活化能Delta E-sigma。薄膜样品的I-V特性曲线显示了在转换点(TOP)处从高电阻状态(OFF状态)切换到负差分电阻状态(NDRS)(ON状态)的存储器。发现在研究范围内,阈值电场Eth的平均值随温度升高呈指数下降。计算开关激活能量ΔE-th。在样品的不同温度下的TOP点进行耗散的阈值功率P-th和阈值电阻R-th的测量。推导了分别由电阻和功率引起的激活能Delta E-R和Delta E-p。获得的结果为该系统中启动开关过程提供了支持的热模型。 (c)2006 Elsevier B.V.保留所有权利。

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