...
首页> 外文期刊>Applied Surface Science >Memory switching of germanium tellurium amorphous semiconductor
【24h】

Memory switching of germanium tellurium amorphous semiconductor

机译:锗碲非晶半导体的存储器开关

获取原文
获取原文并翻译 | 示例

摘要

The dc conductivity and switching properties of amorphous GeTe thin film of thickness 262 nm are investigated in the temperature range 303-373 K. The activation energy ΔE_σ, the room temperature electrical conductivity σ_(RT) and the pre-exponential factor σ_0 were measured and validated for the tested sample. The conduction activation energy ΔE_σ is calculated. The Ⅰ-Ⅴ characteristic curves of the thin film samples showing a memory switching at the turnover point (TOP) from high resistance state (OFF state) to the negative differential resistance state (NDRS) (ON state). It is found that the mean values of the threshold electrical field E_(th) decreased exponentially with increasing temperatures in the investigated range. The switching activation energy ΔE_(th) is calculated. Measurements of the dissipated threshold power P_(th) and the threshold resistance R_(th) were carried out at TOP point at different temperatures of the samples. The activation energies ΔE_R and ΔE_P caused by resistance and power respectively are deduced. The results obtained support thermal model for initiating switching process in this system.
机译:在303-373 K的温度范围内研究了厚度为262 nm的非晶GeTe薄膜的直流电导率和开关特性。测量了活化能ΔE_σ,室温电导率σ_(RT)和前指数因子σ_0,并已针对测试样品进行验证。计算出传导活化能ΔE_σ。薄膜样品的Ⅰ-Ⅴ特性曲线显示了在转换点(TOP)从高电阻状态(OFF状态)到负微分电阻状态(NDRS)(ON状态)的存储切换。发现在研究范围内,随着温度的升高,阈值电场E_(th)的平均值呈指数下降。计算开关激活能量ΔE_(th)。耗散的阈值功率P_(th)和阈值电阻R_(th)在样品的不同温度下的TOP点进行测量。推导了分别由电阻和功率引起的活化能ΔE_R和ΔE_P。获得的结果为该系统中启动开关过程提供了支持的热模型。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号