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Effect of post-annealing temperature on the microstructure and magnetic properties of Ce:YIG thin films deposited on Si substrates

机译:后退火温度对沉积在硅衬底上的Ce:YIG薄膜的微观结构和磁性的影响

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Amorphous Ce_1Y_2Fe_5O_(12) (Ce:YIG) thin films deposited on single crystal Si(100) and thermally oxidized Si(100) substrates by pulsed laser deposition were annealed in the temperature range of 700-1000℃ in air. The annealing temperature dependence of microstructure and magnetic properties of Ce:YIG films was studied using X-ray diffraction combined with vibrating sample magnetometer. The results show that single phase of polycrystalline Ce:YIG thin films can be obtained by the post-annealing of as-deposited films at the temperature of 700℃. However, two steps of phase segregation of Ce: YIG occur as the post-annealing temperature increases: at first, Ce: YIG is decomposed into YIG and non-magnetic CeO_2 when annealed at 800℃; then YIG continues to be decomposed forming Fe_2O_3 when the temperature is increased up to 900℃. Consequently, the saturation magnetization of Ce:YIG films decreases first and then increases with the post-annealing temperature going up, which indicates that the saturation magnetization of Ce:YIG films is mainly related to the phase composition of the films. Meanwhile, the presence of SiO_2 buffer layer can significantly enhance the saturation magnetization of Ce:YIG films.
机译:在700-1000℃的温度范围内,在空气中对非晶Ce_1Y_2Fe_5O_(12)(Ce:YIG)非晶硅薄膜进行沉积,该薄膜通过脉冲激光沉积沉积在单晶Si(100)和热氧化Si(100)衬底上。利用X射线衍射结合振动样品磁强计研究了Ce:YIG薄膜的退火温度依赖性及其组织和磁性。结果表明,在700℃的温度下对沉积后的薄膜进行后退火可以得到单晶的Ce:YIG薄膜。然而,随着退火温度的升高,Ce:YIG发生了两步相分离:首先,在800℃退火时,Ce:YIG分解为YIG和非磁性CeO_2。当温度升高到900℃时,YIG继续分解形成Fe_2O_3。因此,随着后退火温度的升高,Ce:YIG薄膜的饱和磁化强度先降低,然后增加,这表明Ce:YIG薄膜的饱和磁化强度主要与薄膜的相组成有关。同时,SiO_2缓冲层的存在可以显着增强Ce:YIG薄膜的饱和磁化强度。

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