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Preparation of palladium film by coating photolysis process using KrF or ArF excimer laser

机译:KrF或ArF准分子激光的涂层光解法制备钯膜

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The preparation of palladium (Pd) films has been investigated using KrF or ArF laser irradiation on a Pd acetate (PdAc) coated substrate. A crystalline Pd film could be obtained by KrF laser irradiation (fluence = 15-40 mJ/cm~2) but PdAc was found to remain in the film. An increase in the substrate temperature to 423 K decreased the inclusion of the unreacted precursor and produced a better crystallinity. An amorphous and uniform Pd film composed of very fine particles was found to be formed by this process under reduced pressure, which is probably due to the preferential ablation of the crystalline nuclei. ArF laser irradiation is more effective for decomposing the PdAc and for producing a Pd film with a better crystallinity and no (or smaller) organic inclusion.
机译:钯(Pd)膜的制备已在涂覆有乙酸钯(PdAc)的基材上使用KrF或ArF激光辐射进行了研究。通过KrF激光辐照可以得到结晶的Pd膜(注量= 15-40 mJ / cm〜2),但发现PdAc残留在膜中。基板温度升高至423 K会减少未反应前体的夹杂物,并产生更好的结晶度。发现在减压下通过该方法形成了由非常细的颗粒组成的非晶且均匀的Pd膜,这可能是由于晶核的优先烧蚀所致。 ArF激光辐照对于分解PdAc和生产具有更好的结晶度且没有(或更小的)有机夹杂物的Pd膜更为有效。

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