首页> 外文期刊>Applied Surface Science >The Role Of The Laser Fluence On The Al_2o_3 Target In The Nanostructure And Morphology Of Vo_x:al_2o_3 Thin Films Prepared By Pulsed Laser Deposition
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The Role Of The Laser Fluence On The Al_2o_3 Target In The Nanostructure And Morphology Of Vo_x:al_2o_3 Thin Films Prepared By Pulsed Laser Deposition

机译:Al_2o_3靶上的激光注量在脉冲激光沉积制备的Vo_x:al_2o_3薄膜的纳米结构和形貌中的作用

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The role played by the laser fluence on the Al_2O_3 target when depositing VO_x:Al_2O_3 nanocomposite thin films by alternate ablation from ceramic alumina (Al_2O_3) and metallic vanadium (V) targets in vacuum has been studied. The fluence and number of pulses on the V target to prepare the nanoparticles has been maintained constant, while the fluence used to grow the Al_2_3 host has been varied from 1.3 to 3.9 J cm~(-2). The optical properties of the films, namely in-situ reflectivity during growth and extinction coefficient, evidence that the properties of the nanoparticles change as a function of the laser fluence on the Al_2O_3 host. Transmission electron microscopy analysis shows the formation of vanadium oxide nanoparticles with average diameters in the range of 4.6 nm. Structural analysis of the nanoparticles shows that they are mainly crystalline. Phases of VO_x with average [O]/[V] ratios from 1.7 to 2.2 have been identified with the most commonly observed being V_3O_5. This is in agreement with low heat of formation of this oxide. It is shown that the oxidation of the nanoparticles induced during the deposition of Al_2O_3 is very efficient since no metallic V nanoparticles are formed even for the lowest fluence used.
机译:研究了在真空中通过交替烧蚀陶瓷氧化铝(Al_2O_3)和金属钒(V)靶材沉积VO_x:Al_2O_3纳米复合薄膜时,激光注量对Al_2O_3靶材的作用。制备纳米粒子的V靶上的能量密度和脉冲数量保持恒定,而用于生长Al_2_3主体的能量密度在1.3 J cm〜(-2)之间变化。薄膜的光学性质,即生长过程中的原位反射率和消光系数,证明纳米粒子的性质随Al_2O_3主体上激光通量的变化而变化。透射电子显微镜分析显示形成了平均直径在4.6 nm范围内的氧化钒纳米颗粒。纳米颗粒的结构分析表明它们主要是晶体。已经确定平均[O] / [V]比为1.7至2.2的VO_x相位,最常见的是V_3O_5。这与该氧化物的形成热量低相一致。结果表明,在Al_2O_3沉积过程中诱导的纳米颗粒氧化非常有效,因为即使使用最低的通量也不会形成金属V纳米颗粒。

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