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Understanding deviations in lithographic patterns near interfaces: Characterization of bottom anti-reflective coatings (BARC) and the BARC-resist interface

机译:了解界面附近光刻图案的偏差:底部抗反射涂层(BARC)和BARC抗蚀剂界面的表征

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Interactions between a bottom anti-reflective coating (BARC) and a photoresist can critically impact lithographic patterns. For example, a lithographic pattern can shrink or spread near a BARC interface, a process called undercutting or footing respectively, due to incompatibility between the two materials. Experiments were conducted on two industrial BARC coatings in an effort to determine the impact of BARC surface chemistry on the footing and undercutting phenomena. The BARC coatings were characterized by near edge X-ray absorption fine structure (NEXAFS), contact angle measurements, and neutron and X-ray reflectivity. Contact angle measurement using a variety of fluids showed that the fluid contact angles were independent of the type of BARC coating or the BARC processing temperature. NEXAFS measurements showed that the surface chemistry of each BARC was also independent of the processing temperature. These results suggest that acid—base interactions at the BARC-resist interface are not the cause of the footing-undercutting phenomena encountered in lithographic patterns.
机译:底部抗反射涂层(BARC)和光刻胶之间的相互作用会严重影响光刻图案。例如,由于两种材料之间的不相容性,光刻图案可以在BARC界面附近收缩或散布,该过程分别称为底切或立脚。对两种工业BARC涂层进行了实验,目的是确定BARC表面化学性质对立足和咬边现象的影响。 BARC涂层的特征在于近边缘X射线吸收精细结构(NEXAFS),接触角测量以及中子和X射线反射率。使用多种流体的接触角测量结果表明,流体接触角与BARC涂层的类型或BARC加工温度无关。 NEXAFS测量表明,每个BARC的表面化学性质也与加工温度无关。这些结果表明,在BARC-抗蚀剂界面处的酸碱相互作用并非光刻图案中遇到的立足点削弱现象的原因。

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