首页> 外文期刊>Applied Surface Science >Direct conversion of a metal organic compound to epitaxial Sb-doped SnO_2 film on a (001) TiO_2 substrate using a KrF laser, and its resulting electrical properties
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Direct conversion of a metal organic compound to epitaxial Sb-doped SnO_2 film on a (001) TiO_2 substrate using a KrF laser, and its resulting electrical properties

机译:使用KrF激光将金属有机化合物直接转换为(001)TiO_2衬底上的外延掺杂Sb的SnO_2薄膜及其电性能

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摘要

Epitaxial Sb-doped SnO_2 (001) thin film on a TiO_2 (001) substrate was successfully prepared by laser-assisted metal organic deposition at room temperature. The effects of the precursor thin film and laser fluence on the resistivity, carrier concentration, and mobility of the Sb-doped SnO_2 film were investigated. The resistivity of the Sb-doped SnO_2 film prepared by direct irradiation to metal organic film is one order of magnitude lower than that of film prepared by irradiation to amorphous Sb-doped SnO_2 film. From an analysis of Hall measurements, the difference between the resistivity of the Sb-doped SnO_2 film prepared using the metal organic precursor film and that of amorphous precursor film appears to be caused by the mobility. Direct conversion of the metal organic compound by excimer laser irradiation was found to be effective for preparing epitaxial Sb-doped SnO_2 film with low resistivity.
机译:通过在室温下激光辅助金属有机沉积,成功制备了TiO_2(001)衬底上掺Sb的SnO_2(001)外延薄膜。研究了前驱体薄膜和激光能量密度对掺Sb的SnO_2薄膜的电阻率,载流子浓度和迁移率的影响。通过直接照射金属有机膜制备的掺杂Sb的SnO_2膜的电阻率比通过照射非晶Sb掺杂的SnO_2膜制备的膜的电阻率低一个数量级。通过霍尔测量的分析,使用金属有机前体膜制备的掺Sb的SnO_2膜的电阻率与非晶态前体膜的电阻率之间的差异似乎是由迁移率引起的。发现通过准分子激光辐照对金属有机化合物的直接转化对于制备低电阻率的外延掺杂Sb的SnO_2薄膜是有效的。

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  • 来源
    《Applied Surface Science》 |2009年第24期|9808-9812|共5页
  • 作者单位

    National Institute of Advanced Industrial Science and Technology (AIST), Tsukuba Central 5, 1-1-1 Higashi Tsukuba, ibaraki 305-8565, Japan;

    Chiba Institute of Technology, 2-17-1 Tsudanuma, Narashino, Chiba 275-0016, Japan;

    National Institute of Advanced Industrial Science and Technology (AIST), Tsukuba Central 5, 1-1-1 Higashi Tsukuba, ibaraki 305-8565, Japan;

    Chiba Institute of Technology, 2-17-1 Tsudanuma, Narashino, Chiba 275-0016, Japan;

    National Institute of Advanced Industrial Science and Technology (AIST), Tsukuba Central 5, 1-1-1 Higashi Tsukuba, ibaraki 305-8565, Japan;

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  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

    Sb-doped SnO_2; epitaxial; excimer laser;

    机译:掺Sb的SnO_2;外延准分子激光;
  • 入库时间 2022-08-18 03:07:51

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