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Photoluminescent Properties Of Silicon Carbide And Porous Silicon Carbide After Annealing

机译:退火后碳化硅和多孔碳化硅的发光特性

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Photoluminescent (PL) p-type 6H porous silicon carbides (PSCs), which showed a strong blue-green photoluminescence band centered at approximately 490 nm, were annealed in Ar and vacuum conditions. The morphological, optical, and chemical states after annealing are reported on electrochemically etched SiC semiconductors.rnThe thermal treatments in the Ar and vacuum environments showed different trends in the PL spectra of the PSC. In particular, in the case of annealing in a vacuum, the PL spectra showed both a weak red PL peak near 630 nm and a relatively intense PL peak at around 430 nm in the violet region. SEM images showed that the etched surface had spherical nanostructures, mesostructures, and islands. With increasing annealing temperature it changes all spherical nanostructures. The average pore size observed at the surface of the PSC before annealing was of the order of approximately 10 nm.rnIn order to investigate the surface of a series of samples in detail, both the detection of a particular chemical species and the electronic environments at the surface are examined using X-ray photoelectron spectroscopy (XPS). The chemical states from each XPS spectrum depend differently before and after annealing the surface at various temperatures. From these results, the PL spectra could be attributed not only to the quantum size effects but also to the oxide state.
机译:在Ar和真空条件下对光致发光(PL)p型6H多孔碳化硅(PSC)进行了退火,该碳化硅显示出以大约490 nm为中心的强蓝绿色光致发光带。在电化学腐蚀的SiC半导体上报告了退火后的形态,光学和化学状态。rn在Ar和真空环境下的热处理在PSC的PL光谱中显示出不同的趋势。特别地,在真空中退火的情况下,PL光谱在紫色区域中既显示了在630nm附近的弱红色PL峰,又显示了在430nm附近的相对强的PL峰。 SEM图像显示蚀刻的表面具有球形的纳米结构,介观结构和岛。随着退火温度的升高,它改变了所有球形纳米结构。在退火之前,在PSC表面观察到的平均孔径约为10 nm。为了详细研究一系列样品的表面,无论是检测特定的化学物种还是电子环境,在使用X射线光电子能谱(XPS)检查表面。每个XPS光谱的化学状态在各种温度下对表面进行退火之前和之后的影响都不同。从这些结果,PL光谱不仅可以归因于量子尺寸效应,而且可以归因于氧化物态。

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