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Thin films deposited by femtosecond pulsed laser ablation of tungsten carbide

机译:飞秒脉冲激光烧蚀碳化钨沉积的薄膜

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摘要

Ultra-short Pulsed Laser Deposition has been applied to the production of thin films from a tungsten carbide target. The gaseous phase obtained by the laser ablation shows a very weak primary plume, in contrast with a very strong secondary one. The deposited films, investigated by Scanning Electron Microscopy, Atomic Force Microscopy, X-Ray Photoelectron Spectroscopy and X-Ray Diffraction, present a mixture of WC and other phases with lower carbon content. All films are amorphous, independently from the substrate temperature. The characteristics of the deposits have been explained in terms of thermal evaporation and cooling rate of molten particles ejected from the target.
机译:超短脉冲激光沉积已被用于由碳化钨靶材生产薄膜。与非常强的次级烟羽相反,通过激光烧蚀获得的气相显示非常弱的初级烟羽。通过扫描电子显微镜,原子力显微镜,X射线光电子能谱和X射线衍射研究的沉积膜呈现出WC和其他碳含量较低的相的混合物。所有薄膜都是无定形的,与基材温度无关。沉积物的特性已根据从靶子喷出的熔融颗粒的热蒸发和冷却速率进行了解释。

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  • 来源
    《Applied Surface Science》 |2012年第23期|p.9198-9201|共4页
  • 作者单位

    Dipartimento di Chimica "A.M. Tamburro", Universita delta Basilicata, Via dell'Ateneo Lucano 10, 85100 Potenza, Italy,Consorzio Interuniversitario Nazionale per la Scienza e Tecnologia del Materiali - INSTM, Via G. Giusti 9, 00121 Florence, Italy;

    Dipartimento di Chimica "A.M. Tamburro", Universita delta Basilicata, Via dell'Ateneo Lucano 10, 85100 Potenza, Italy,Consorzio Interuniversitario Nazionale per la Scienza e Tecnologia del Materiali - INSTM, Via G. Giusti 9, 00121 Florence, Italy;

    Istituto Metodologie Inorganiche e Plasmi, CNR, Unita di Potenza, via S. Loja, 85050 Tito Scalo PZ, Italy;

    Dipartimento di Chimica "A.M. Tamburro", Universita delta Basilicata, Via dell'Ateneo Lucano 10, 85100 Potenza, Italy;

    Istituto di Struttura della Materia, CNR, Via del Fosso del Cavaliere 100.00133 Rome, Italy;

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  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

    tungsten carbide; ultra-short pulse laser; pulsed laser deposition; nanoparticles;

    机译:碳化钨超短脉冲激光脉冲激光沉积纳米粒子;

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