机译:射频反应磁控共溅射Cd掺杂SnO_2薄膜的结构,光学和电学性质
Physics Department, CINVESTAV-IPN, Apdo. Postal 14-740, Mexico D.F. 07000, Mexico;
Physics Department, CINVESTAV-IPN, Apdo. Postal 14-740, Mexico D.F. 07000, Mexico;
Physics Department, CINVESTAV-IPN, Apdo. Postal 14-740, Mexico D.F. 07000, Mexico;
Physics Department, CINVESTAV-IPN, Apdo. Postal 14-740, Mexico D.F. 07000, Mexico;
Univ Guadalajara, CUCE1, Dept Fis, Guadalajara 44430, Jalisco, Mexico;
Electrical Engineering Department, Solid State Section, GNVESTAV-IPN, Apdo. Postal 14-740, Mexico D.F. 07000, Mexico;
Physics Department, CINVESTAV-IPN, Apdo. Postal 14-740, Mexico D.F. 07000, Mexico;
Cd-doped tin oxide; thin films; RF-magnetron sputtering; high transmittance; transparent electrodes;
机译:通过反应磁控共溅射调节室温生长的Al掺杂ZnO薄膜的电学和光学性质:从带隙到近红外
机译:通过反应磁控共溅射调节室温生长的Al掺杂ZnO薄膜的电学和光学性质:从带隙到近红外
机译:直流和射频反应磁控共溅射合成Zn1-xCdxO薄膜的结构形成和光学性质的研究
机译:(07E327)由3烃磁控磁控混凝器生长的半风格勒拉-PT-BI薄膜的结构和电性能
机译:研究磁控溅射生产的氧化锌基薄膜的结构,电,光和磁性能。
机译:射频磁控溅射制备(MgAl)共掺杂ZnO薄膜的光电性能研究与研究
机译:RF磁控溅射生长的Cu掺杂ZnO薄膜的结构,光学和电性能:太阳能光催化的应用