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Highly nonlinear varistors from oxygen-deficient zinc oxide thin films by hot-dipping in Bi2O3: Influence of temperature

机译:通过热浸在Bi2O3中的缺氧氧化锌薄膜的高度非线性压敏电阻:温度的影响

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摘要

Highly nonlinear varistors were fabricated by hot-dipping oxygen-deficient zinc oxide (ZnO1-x, x < 1) thin films in Bi2O3. The ZnO1-x, films were deposited on conducting silicon chips by radio frequency magnetron sputtering of a sintered zinc oxide ceramic target. Then the films were hot-dipped at a temperature from 200 to 600 degrees C in Bi2O3. With the increase in hot-dipping temperature, the nonlinear coefficient (alpha) of the film varistors increases first and then decreases, and the leakage current (I-L) correspondingly decreases initially and then increases, owing mainly to the formation and destroying of complete ZnO1-x/Bi2O3 grain boundaries and the roundness change of the ZnO1-x, grains; and the varistor voltage (E-1mA) decreases from 0.0268 to 0.0137 Vm, due to the decreased number of effective grain boundaries in the materials. The film varistors prepared by hot-dipping at 400 degrees C exhibit the optimum nonlinear properties with the highest alpha = 15.1, lowest I-L = 0.0223 mA/cm(2), and E-1mA = 0.0176 Vm. Such nanoscaled film varistors will be very promising in electrical/electronic devices working in low-voltage. (C) 2016 Elsevier B.V. All rights reserved.
机译:通过在Bi2O3中热浸缺氧的氧化锌(ZnO1-x,x <1)薄膜来制造高度非线性的压敏电阻。通过射频磁控溅射烧结氧化锌陶瓷靶,在导电硅芯片上沉积ZnO1-x薄膜。然后将薄膜在Bi2O3中于200至600摄氏度的温度下热浸。随着热浸温度的升高,薄膜压敏电阻的非线性系数(α)先增大然后减小,并且漏电流(IL)相应地先减小然后增大,这主要是由于完整ZnO1的形成和破坏所致。 x / Bi2O3晶界和ZnO1-x晶粒的圆度变化;由于材料中有效晶界数量的减少,压敏电阻电压(E-1mA)从0.0268降至0.0137 V / nm。通过在400摄氏度下热浸制备的薄膜压敏电阻具有最佳的非线性特性,其中最高alpha = 15.1,最低I-L = 0.0223 mA / cm(2),E-1mA = 0.0176 V / nm。这种纳米级薄膜压敏电阻在低压工作的电气/电子设备中将是非常有前途的。 (C)2016 Elsevier B.V.保留所有权利。

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  • 来源
    《Applied Surface Science》 |2016年第30期|92-99|共8页
  • 作者单位

    China Univ Geosci, Sch Engn & Technol, Beijing 100083, Peoples R China|Beijing Univ Posts & Telecommun, Sch Sci, Beijing 100876, Peoples R China;

    China Univ Geosci, Sch Engn & Technol, Beijing 100083, Peoples R China;

    China Univ Geosci, Sch Engn & Technol, Beijing 100083, Peoples R China|Beijing Univ Posts & Telecommun, Sch Sci, Beijing 100876, Peoples R China;

    Beijing Univ Posts & Telecommun, Sch Sci, Beijing 100876, Peoples R China;

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  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

    ZnO varistor; Thin film; RF magnetron sputtering; Hot-dipping; Electrical properties;

    机译:ZnO压敏电阻薄膜射频磁控溅射热浸电性能;

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