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Ag-doped double-sided PLD-YBCO thin films for passive microwave devices in future communication systems

机译:用于未来通信系统中无源微波器件的掺银双面PLD-YBCO薄膜

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Pulsed laser deposited (PLD) Ag-doped YBa/sub 2/Cu/sub 3/O/sub 7-x/ (YBCO) thin films on both sides of 3-inch diameter sapphire wafers are used routinely for development of microwave filters for future communication systems. The reproducibly deposited YBCO:Ag films of about 250 nm thickness show critical current densities of 4 MA/cm/sup 2/ at 77 K and laterally homogeneous maps of microwave surface resistance R/sub s/ of about 45 m/spl Omega/ at 145 GHz and 77 K measured by an open resonator technique. The R/sub s/ at 8.4 GHz and 77 K determined in the center position of the YBCO:Ag films with a sapphire resonator technique remains constant at about 380 /spl mu//spl Omega/ up to a microwave surface magnetic field of 7-10 mT. Correlations of transport and microwave properties to the film microstructure are shown in terms of in-plane epitaxy, size of particulates on the films, and composition ratios Cu/O and Y/O, and growth defects like stacking faults as shown by Raman spectroscopy, SEM, and SNMS depth profiling, and TEM cross sections, respectively. The optimum Ag-content of the PLD-YBCO target was determined to be about 4 weight -%. The results demonstrate that Ag-doping supports the PLD process for YBCO in terms of reliability and cost effectiveness.
机译:在直径为3英寸的蓝宝石晶片的两面上均使用脉冲激光沉积(PLD)掺杂银的YBa / sub 2 / Cu / sub 3 / O / sub 7-x /(YBCO)薄膜来开发用于微波的滤光片未来的通信系统。可重现沉积的约250 nm厚度的YBCO:Ag膜在77 K时显示4 MA / cm / sup 2 /的临界电流密度,并且在45Ω/ s时微波表面电阻R / sub s /的横向均匀分布图通过开放式谐振器技术测得的145 GHz和77K。使用蓝宝石谐振器技术在YBCO:Ag膜的中心位置确定的8.4 GHz和77 K时的R / sub s /保持恒定,约为380 / spl mu // spl Omega /,直至微波表面磁场为7 -10米通过面内外延,膜上颗粒的大小,Cu / O和Y / O的组成比以及生长缺陷(如堆垛层错)(如拉曼光谱法)显示了传输和微波特性与膜微结构的相关性, SEM和SNMS深度剖析以及TEM横截面。确定PLD-YBCO靶的最佳Ag含量为约4重量%。结果表明,Ag掺杂在可靠性和成本效益方面支持YBCO的PLD工艺。

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