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Ag-doped large-area double-sided YBaCuO and GdBaCuO thin films for microwave applications

机译:用于微波应用的AG掺杂的大面积双面ybacuo和gdbacuo薄膜

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The influence of Ag-doping was investigated on structural, electrical and microwave properties of pulsed laser deposited YBaCuO thin films on 3-inch diameter sapphire wafers. Up to now, no significant improvement of microwave surface resistance R, was found due to Ag-doping. However, Ag-doped YBCO films show a reduced surface roughness, improved homogeneity and reproducibiliry of Rs and critical current density, and no residues after wet chemical etching of stripline structures. Therefore, the pulsed laser deposition process seems to be assisted by Ag-doping of YBaCuO. The microwave surface resistance correlates with the degree of in-plane epitaxy of the YBCO:Ag thin films as measured by polarized Raman spectroscopy, and with the size of laser droplets in the films. Up to now, Rs of PLD-YBCO thin films remains constant at about 500 ufi (8.5 GHz, 77 K) and 180 ufi (19 GHz, 4.2 K) up to surface magnetic field of about 7 mT.
机译:研究了Ag-掺杂的影响,对脉冲激光沉积的3英寸直径蓝宝石晶片上的脉冲激光沉积的Ybacuo薄膜的结构,电和微波性能进行研究。到目前为止,由于Ag-掺杂,发现了微波表面电阻R的显着改善。然而,Ag掺杂的YBCO薄膜表现出降低的表面粗糙度,改善RS和临界电流密度的均匀性和再生率,并且在湿化化学蚀刻后没有残留物。因此,脉冲激光沉积过程似乎通过Ag-Doping的YBacuo辅助。微波表面电阻与通过偏振拉曼光谱测量的YBCO:Ag薄膜的面内外延的程度相关,并且在薄膜中具有激光液滴的尺寸。到目前为止,PLD-YBCO薄膜的卢比保持恒定在约500 UFI(8.5GHz,77 k)和180 UFI(19GHz,4.2 k)上,直到约7mt的表面磁场。

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