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Epitaxial Non c-Axis Twin-Free Bi2Sr2CaCu2O8+δ Thin Films for Future THz Devices

机译:用于未来THz器件的外延非c轴双自由Bi2Sr2CaCu2O8 +δ薄膜

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摘要

Thin films of (117) Bi2Sr2Ca2CuO8+δ (Bi-2212) were grown by Molecular Organic Chemical Vapor Deposition (MOCVD) on (110) SrTiO3 and (110) LaAlO3 substrates. Substrates were vicinal with off angles up to 20°. Films are 3D epitaxial and X-ray diffraction φ-ψ scans demonstrate that, while the films grown on a flat substrate are composed of twinned grains, the films on vicinal substrate are twin-free. A higher quality is obtained if growth is performed at two temperatures: Growth starts at 550–600 °C and continues at 700–750 °C. The twin-free film grown by the two-temperature method shows a zero-resistance critical temperature of 37 and 32 K when the measuring current is applied in-plane parallel and perpendicular to [001] direction of the substrate. Twin-free non c-axis thin films are promising for fabrication of novel planar THz devices.
机译:通过分子有机化学气相沉积(MOCVD)在(110)SrTiO3和(110)LaAlO3基板上生长(117)Bi2Sr2Ca2CuO8 +δ(Bi-2212)薄膜。基材是邻位的,倾斜角度最大为20°。薄膜是3D外延的,X射线衍射φ-ψ扫描表明,虽然在平坦基板上生长的薄膜是由孪晶晶粒组成的,但在邻近基板上的薄膜却没有孪晶。如果在两个温度下进行生长,则可获得更高的质量:生长在550–600°C开始,并在700–750°C继续。当在平行于且垂直于基板的[001]方向的平面内施加测量电流时,通过双温度法生长的无双膜显示出零电阻临界温度为37和32K。无孪晶非c轴薄膜有望用于制造新型平面THz器件。

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