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Influence of film thickness on the critical current of YBa2Cu3O7-x thick films on Ni-V biaxiallytextured substrates

机译:膜厚对Ni-V双轴织构衬底上YBa2Cu3O7-x厚膜临界电流的影响

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摘要

A promising approach to improve the engineering current density of coated conductors is to increase the thickness of the YBa2Cu 3O7-x (YBCO) layer. In this framework, a study regarding the relationship between the thickness of the superconducting film and its critical current was performed on biaxially aligned YBCO films grown on epitaxial Ce2O/NiO structure using Ni89 V11 non-magnetic substrate. The critical current density (JC) was measured for a series of YBCO films with thickness ranging from 0.2 to 2 μm, deposited at constant rate. JC values up to 6.4×105 A/cm2 at 77 K and zero magnetic field were obtained for thinner films decreasing three orders of magnitude for the 2 μm thick YBCO film. X-ray diffraction and morphological analyses indicate a progressive structural deterioration with the increase of film thickness
机译:改善涂层导体工程电流密度的一种有前途的方法是增加YBa2Cu 3O7-x(YBCO)层的厚度。在此框架下,对使用Ni89 V11非磁性衬底在外延Ce2O / NiO结构上生长的双轴取向YBCO膜进行了有关超导膜厚度及其临界电流之间关系的研究。对于以恒定速率沉积的一系列厚度为0.2至2μm的YBCO膜,测量了临界电流密度(JC)。对于厚度为2μm的YBCO薄膜,薄膜厚度降低了三个数量级,在77 K和零磁场下的JC值高达6.4×105 A / cm2。 X射线衍射和形态分析表明,随着膜厚的增加,结构逐渐恶化

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