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High critical current density YBa2Cu3O7-x films grown on mechanically polished surface-oxidized NiO/Ni substrates

机译:在机械抛光的表面氧化的NiO / Ni衬底上生长的高临界电流密度YBa2Cu3O7-x膜

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摘要

A NiO surface produced by surface-oxidation epitaxy (SOE) method was flattened by a mechanical polishing technique. The surface roughness of NiO was reduced in this manner to about 5 nm. In addition, thin perovskite films were deposited on the polished NiO as a new cap layer. Consequently, Jc of the YBCO films formed on BaSnO3/NiO/Ni substrate by pulsed laser deposition reached 0.45 MA/cm2 (77 K, 0 T), and Jc of YBCO/BaZrO3/NiO/Ni increased up to 0.89 MA/cm2 (77 K, 0 T). Development of Jc is due to the reduction of superconducting weak coupling by flattening of NiO surfaces and the improvement of crystal orientation of YBCO films by the use of perovskite cap layers.
机译:通过机械抛光技术将通过表面氧化外延(SOE)方法生产的NiO表面弄平。以这种方式将NiO的表面粗糙度降低至约5nm。另外,钙钛矿薄膜沉积在抛光的NiO上作为新的覆盖层。因此,通过脉冲激光沉积在BaSnO3 / NiO / Ni衬底上形成的YBCO膜的Jc达到0.45 MA / cm2(77 K,0 T),YBCO / BaZrO3 / NiO / Ni的Jc增加到0.89 MA / cm2( 77 K,0 T)。 Jc的发展归因于通过平整NiO表面减少了超导弱耦合,以及通过使用钙钛矿覆盖层改善了YBCO膜的晶体取向。

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