首页> 外国专利> A polishing composition for finish polishing of a Ni-P plated aluminum magnetic disk substrate, a method for polishing an Ni-P plated aluminum magnetic disk substrate, a method for producing a Ni-P plated aluminum magnetic disk substrate, and a Ni-P Plated aluminum magnetic disk substrate

A polishing composition for finish polishing of a Ni-P plated aluminum magnetic disk substrate, a method for polishing an Ni-P plated aluminum magnetic disk substrate, a method for producing a Ni-P plated aluminum magnetic disk substrate, and a Ni-P Plated aluminum magnetic disk substrate

机译:用于完成Ni-P镀铝磁盘基板的抛光的抛光组合物,用于抛光Ni-P镀铝磁盘基板的方法,用于制造Ni-P镀铝磁盘基板的方法和Ni-P电镀铝磁盘基板

摘要

PROBLEM TO BE SOLVED: To provide a finish polishing abrasive composition capable of reducing the scratches of a substrate after polishing, and also to provide a method for polishing a magnetic disk substrate using the finish polishing abrasive composition, a method for producing a magnetic disk substrate using the finish polishing abrasive composition, and a magnetic disk substrate.SOLUTION: The finish polishing abrasive composition comprises abrasive material, acid, oxidizer, scratch reducing agent that reduces scratch, and water. The scratch reducing agent is a sulfonic acid-based anionic surfactant and/or sulfuric acid ester-based anionic surfactant, and the anionic surfactants have amide structures.
机译:解决的问题:提供一种能够减少抛光后基板的刮擦的抛光研磨剂组合物,并且还提供一种使用该抛光研磨剂组合物对磁盘基板进行抛光的方法,一种磁盘基板的制造方法。解决方案:精抛光磨料组合物包含磨料,酸,氧化剂,减少划痕的划痕减少剂和水。划痕减少剂是基于磺酸的阴离子表面活性剂和/或基于硫酸酯的阴离子表面活性剂,并且该阴离子表面活性剂具有酰胺结构。

著录项

  • 公开/公告号JP6110716B2

    专利类型

  • 公开/公告日2017-04-05

    原文格式PDF

  • 申请/专利权人 山口精研工業株式会社;

    申请/专利号JP20130083405

  • 发明设计人 安藤 順一郎;

    申请日2013-04-11

  • 分类号C09K3/14;B24B37;G11B5/84;

  • 国家 JP

  • 入库时间 2022-08-21 13:54:16

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