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High critical current density YBa/sub 2/Cu/sub 3/O/sub 7-x/ films grown on mechanically polished surface-oxidized NiO/Ni substrates

机译:在机械抛光的表面氧化NiO / Ni衬底上生长的高临界电流密度YBa / sub 2 / Cu / sub 3 / O / sub 7-x /膜

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摘要

A NiO surface produced by surface-oxidation epitaxy (SOE) method was flattened by a mechanical polishing technique. The surface roughness of NiO was reduced in this manner to about 5 nm. In addition, thin perovskite films were deposited on the polished NiO as a new cap layer. Consequently, J/sub c/ of the YBCO films formed on BaSnO/sub 3//NiO/Ni substrate by pulsed laser deposition reached 0.45 MA/cm/sup 2/ (77 K, 0 T), and J/sub c/ of YBCO/BaZrO/sub 3//NiO/Ni increased up to 0.89 MA/cm/sup 2/ (77 K, 0 T). Development of J/sub c/ is due to the reduction of superconducting weak coupling by flattening of NiO surfaces and the improvement of crystal orientation of YBCO films by the use of perovskite cap layers.
机译:通过机械抛光技术将通过表面氧化外延(SOE)方法生产的NiO表面弄平。以这种方式将NiO的表面粗糙度降低至约5nm。另外,钙钛矿薄膜沉积在抛光的NiO上作为新的覆盖层。因此,通过脉冲激光沉积在BaSnO / sub 3 // NiO / Ni基板上形成的YBCO膜的J / sub c /达到0.45 MA / cm / sup 2 /(77 K,0 T),并且J / sub c / YBCO / BaZrO / sub 3 // NiO / Ni的含量增加至0.89 MA / cm / sup 2 /(77 K,0 T)。 J / sub c /的发展是由于通过使用钙钛矿覆盖层减少了NiO表面的平整而减少了超导弱耦合,并改善了YBCO膜的晶体取向。

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