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Method of measuring the critical current density and current-voltage characteristics of superconducting thick film, and equipment

机译:测量超导厚膜的临界电流密度和电流-电压特性的方法及设备

摘要

PROBLEM TO BE SOLVED: To provide a measuring method and instrument for nondestructively and noncontactingly measuring exactly a critical current density and a current-voltage characteristic of a superconductor thick film.;SOLUTION: An alternating current is made to flow in a coil arranged just above the superconductor thick film, the critical current density of the superconductor thick film is found based on an alternating current value corresponding to a point where an increase of the third harmonic induced voltage gets moderate abruptly by detecting the current and the third harmonic induced voltage induced in the coil by the current. The current-voltage characteristic of the superconductor thick film is measured by changing frequency of the alternating current to measure the critical current densities a plurality of times, using the method.;COPYRIGHT: (C)2005,JPO&NCIPI
机译:解决的问题:提供一种用于无损和非接触地精确测量超导体厚膜的临界电流密度和电流-电压特性的测量方法和仪器;解决方案:使交流电在布置在上方的线圈中流动在超导体厚膜上,通过检测通过检测电流和感应到的三次谐波感应电压而对应于三次谐波感应电压的增加突然变缓的点的交流电流值,来找到超导体薄膜的临界电流密度。通过电流线圈。超导体厚膜的电流-电压特性是通过改变交流电的频率来测量的,从而使用该方法多次测量临界电流密度。COPYRIGHT:(C)2005,JPO&NCIPI

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