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首页> 外文期刊>Applied Physics A: Materials Science & Processing >X-ray Diffraction Micro-imaging Of Strain In Laterally Overgrown Gaas Layers. Part Ii: Analysis Of Multi-stripe And Fully Overgrown Layers
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X-ray Diffraction Micro-imaging Of Strain In Laterally Overgrown Gaas Layers. Part Ii: Analysis Of Multi-stripe And Fully Overgrown Layers

机译:X射线衍射显微成像在横向过度生长的Gaas层中的应变。第二部分:多条带和完全长满的层的分析

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摘要

As a development of our previous analysis of a single GaAs stripe, in this work spatially resolved X-ray diffraction (SRXRD) was applied for micro-imaging of strain in partially and fully overgrown GaAs layers grown by epitaxial lateral overgrowth (ELO) on SiO_2-masked GaAs substrates. We show that a standard X-ray diffraction providing information integrated over many stripes leads to overestimation of lattice misorientation in such samples. On the contrary, the SRXRD allows precise measurements of local wing tilts of individual ELO stripes with micrometer-scale spatial resolution. A complex strain field was found in fully overgrown GaAs ELO samples. With the use of the SRXRD technique, the distribution of this strain was measured that allowed reproducing the shape of deformed lattice planes both inside the epitaxial layer as well as in the substrate underneath.
机译:作为我们先前对单个GaAs条纹的分析的发展,在这项工作中,通过空间分辨X射线衍射(SRXRD)对通过SiO_2外延横向过生长(ELO)生长的部分和完全过度生长的GaAs层中的应变进行了显微成像。掩模的GaAs衬底。我们显示,标准的X射线衍射提供了整合在许多条纹上的信息,导致对此类样品中晶格取向错误的估计过高。相反,SRXRD允许以微米级的空间分辨率精确测量各个ELO条纹的局部机翼倾斜。在完全长满的GaAs ELO样品中发现了一个复杂的应变场。使用SRXRD技术,测量了该应变的分布,从而可以在外延层内部以及其下的衬底中再现变形的晶格平面的形状。

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