机译:衬底温度对直流磁控溅射沉积CoPt / AlN多层膜的磁性和内应力的影响
Department of Metallurgy and Ceramics Science, Tokyo Institute of Technology, 2-12-1, Ookayama, Meguro-ku, Tokyo 152-8552, Japan;
Department of Metallurgy and Ceramics Science, Tokyo Institute of Technology, 2-12-1, Ookayama, Meguro-ku, Tokyo 152-8552, Japan;
Department of Metallurgy and Ceramics Science, Tokyo Institute of Technology, 2-12-1, Ookayama, Meguro-ku, Tokyo 152-8552, Japan;
Department of Metallurgy and Ceramics Science, Tokyo Institute of Technology, 2-12-1, Ookayama, Meguro-ku, Tokyo 152-8552, Japan;
Department of Metallurgy and Ceramics Science, Tokyo Institute of Technology, 2-12-1, Ookayama, Meguro-ku, Tokyo 152-8552, Japan;
Department of Metallurgy and Ceramics Science, Tokyo Institute of Technology, 2-12-1, Ookayama, Meguro-ku, Tokyo 152-8552, Japan;
机译:射频和直流磁控管同时溅射在不同衬底温度下沉积的ZnO / Cu / ZnO多层膜的性能
机译:通过脉冲直流磁控溅射以不同的溅射功率和衬底温度沉积的Ga掺杂ZnO薄膜及其性能改善潜力
机译:衬底温度和偏压对玻璃衬底上直流磁控溅射AlN膜性能的影响
机译:底物温度对DC磁控溅射沉积的氧化铝氧化锌薄膜光学性质的影响
机译:研究ha和铬的添加对沉积在镍基高温合金上的直流磁控溅射β-镍-铝粘结涂层的微观结构和短期氧化性能的影响。
机译:溅射AlN:Er薄膜的基底温度相关特性用于Al / AlN多层涂层健康的原位发光传感
机译:压力对Si(100)基材的DC反应磁控溅射沉积的ALN性能的影响