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首页> 外文期刊>Microelectronics journal >Properties of ZnO/Cu/ZnO multilayer films deposited by simultaneous RF and DC magnetron sputtering at different substrate temperatures
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Properties of ZnO/Cu/ZnO multilayer films deposited by simultaneous RF and DC magnetron sputtering at different substrate temperatures

机译:射频和直流磁控管同时溅射在不同衬底温度下沉积的ZnO / Cu / ZnO多层膜的性能

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摘要

ZnO/Cu/ZnO transparent conductive multilayer films are prepared by simultaneous RF sputtering of ZnO and DC sputtering of Cu. The properties of the multilayer films are studied at different substrate temperatures. Sheet resistance of the multilayer film decreased initially with increase of substrate temperature and increased further with increase of substrate temperature beyond 100℃. However, transmittance of the multilayer film increased with increase of substrate temperature. Good transparent conductive film of sheet resistance 9.3Ω/sq and transmittance of 85% was found at a substrate temperature of 100℃. The performance of the multilayer film was evaluated using a figure of merit. The observed property of the multilayer film is suitable for the application of transparent conductive electrodes.
机译:通过同时进行ZnO的RF溅射和Cu的DC溅射来制备ZnO / Cu / ZnO透明导电多层膜。在不同的基板温度下研究了多层膜的性能。多层薄膜的薄层电阻最初随着基底温度的升高而降低,并随着基底温度超过100℃的升高而进一步升高。但是,多层膜的透射率随着基板温度的升高而增加。在衬底温度为100℃时,发现薄电阻为9.3Ω/ sq,透射率为85%的透明导电膜良好。使用品质因数评价多层膜的性能。观察到的多层膜的性能适合于透明导电电极的应用。

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