Effect of metals on UV-excited plasmonic lithography for sub-50 nm periodic feature fabrication

摘要

This paper describes and compares the effect of metal films, such as aluminum (Al) and silver (Ag) on UV-excited two-beam surface plasmon interference nanolithography. A planar four-layer configuration has been employed to study the light intensity distribution on the recording medium. It is observed that high-density sub-50 nm periodic structures were achievable by employing the above-mentioned metal films when interrogated with p-polarized, 364 nm illumination wavelength source. It is found that the obtained periodic feature shows good exposure depth and high contrast when Al is used as a metal film. The initial experimental result of planar four-layer configuration is also presented.