METHOD FOR MAKING STAMP FOR PLASMONIC NANO LITHOGRAPHY APPARATUS PLASMONIC NANO LITHOGRAPHY APPARATUS

摘要

The present invention relates to a method for manufacturing a stamp unit plasmonic nanolithography, nano plasmonic of the present invention A stamp manufacturing method for a lithographic apparatus is a metal pattern forming method comprising: forming a metal pattern is provided as a material having a plasmonic 0 people (plasmonic resonance) characteristics on a substrate; Hydrophobic treatment comprising a hydrophobic treatment by coating of a hydrophobic film on the surface of the substrate and the metal pattern; Hydrophilic hydrophilic treatment step for selectively processing only the outer surface of the metal pattern; Buffer layer lamination step of laminating the substrate and the buffer layer on the metal pattern; And a buffer layer coupled to the metal pattern to the transfer coupling toward the base of the light-transmitting material from the substrate; characterized in that it comprises a Therefore, according to the present invention, the light diffracted by the surface plasmon energy is provided to overcome the limitations that can plasmonic lithography stamp for nano-device manufacturing method and a plasma mode nicks nanolithography apparatus for fine pattern formation. ;