METHOD FOR MANUFACTURING STAMP FOR PLASMONIC NANO-LITHOGRAPHY AND APPARATUS FOR PLASMONIC NANO-LITHOGRAPHY

摘要

The present invention relates to a method for manufacturing a stamp for plasmonic nano-lithography. The method for manufacturing a stamp for plasmonic nano-lithography comprises: a metal pattern formation step which forms metal patterns on a substrate; a hydrophobic treatment step which coats the outer surface of the substrate and the metal patterns with hydrophobic thin films for hydrophobic treatment; a hydrophilic treatment step which selectively conducts hydrophilic treatment on the outer surface of the metal patterns; a buffer layer lamination step which laminates the buffer layer on the substrate and the metal patterns; and a combination step which transfers the metal patterns and the buffer layer from the substrate to a light permeable base side. The present invention provides the method for manufacturing the stamp for plasmonic nano-lithography and the apparatus for plasmonic nano-lithography which can overcome limitation of light diffraction using surface plasmon energy and form micropatterns.;COPYRIGHT KIPO 2014;[Reference numerals] (AA) Start; (BB) End; (S105) Pretreatment step; (S110,S210) Metal pattern formation step; (S120) Hydrophobic treatment step; (S130) Hydrophilic treatment step; (S131) Polymer layer lamination step; (S132) First lamination step; (S133) Plasma treatment step; (S134) Second lamination step; (S135) First removal step; (S136) Selective treatment step; (S137) Second removal step; (S140) Buffer layer lamination step; (S150) Combination step; (S160) Anti-sticking layer lamination step