Simultaneous in situ measurements of x-ray reflectivity and optical spectroscopy during organic semiconductor thin film growth

摘要

Simultaneous in situ real-time measurements of x-ray reflectivity and differential reflectance spectroscopy were conducted during deposition of perfluorinated copper-phthalocyanine thin films on SiO2/Si. We found a continuous spectral change coinciding with structural changes from submonolayer coverage, to standing βbilayer-phase and to β-phase for thicker films. This combined measurement enables us to study the relationship between structural and optical properties of organic semiconductor thin films.