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Optical and X-ray Spectroscopy of Wide Band Gap Semiconductors and Organic Thin Films

机译:宽带隙半导体和有机薄膜的光学和X射线光谱

摘要

This thesis reports upon synchrotron based luminescence studies of wide band gap semi-conductors and organic thin films.udThe optical and structural electronic properties of cubic and hexagonal boron nitride have been studied using X-ray Excited Optical Luminescence (XEOL) and Optically Detected X-ray Absorption Spectroscopy (OD-XAS). UV/visible emission was identified in both h-BN and c-BN with additional exciton related deep UV emission for the former. UV excited luminescence measurements were used to determine the band gap energies of h-BN and c-BN, these were found to be 5.96eV ? 0.04eV and 6.36eV ? 0.03eV respectively. Spatially resolved XEOL and OD-XAS was used to investigate c-BN microcrystals revealing lateral differences in luminescence and local structure. Synchrotron/laser pump probe spectroscopy was applied to investigate defect states in h-BN and c-BN. Subsequent correlation to the XEOL emission was made proving these defects states to be responsible for the lowest energy emission bands in both materials.udAngular resolved NEXAFS, photo-luminescence (PL) and OD-XAS was used to characterise spin coated thin organic films of poly(phenylamine). The material was shown to exhibit preferred orientation within the film, but spatially resolved imaging OD-XAS revealed lateral variation in the molecular orientation. Electrospray deposition was developed for the growth of thin organic semiconducting films in ultra high vacuum. PL and OD-XAS studies were carried out on pure and mixed films of tetra sulfonated copper phthalocyanine (tsCuPc) and poly(ethyleneoxide) (PEO). Only the mixed complexes displayed infrared emission resulting from disstacking of the tsCuPc by the PEO within the film.
机译:本文对宽带隙半导体和有机薄膜进行基于同步加速器的发光研究。 ud使用X射线激发光致发光(XEOL)和光学检测X研究了立方氮化硼和六方氮化硼的光学和结构电子性质。射线吸收光谱法(OD-XAS)。在h-BN和c-BN中都确定了UV /可见光发射,并且前者还具有与激子相关的深紫外发射。用紫外激发发光测量确定h-BN和c-BN的带隙能,发现它们为5.96eV≤m。 0.04eV和6.36eV​​?分别为0.03eV。空间分辨的XEOL和OD-XAS用于研究c-BN微晶,揭示了发光和局部结构的侧向差异。同步加速器/激光泵浦探针光谱用于研究h-BN和c-BN中的缺陷状态。随后与XEOL发射相关,证明了这些缺陷状态是两种材料中最低的能量发射带的原因。 ud角分辨NEXAFS,光致发光(PL)和OD-XAS用于表征旋涂的有机薄膜。聚苯胺显示该材料在膜内表现出优选的取向,但是空间分辨成像OD-XAS揭示了分子取向的横向变化。开发了电喷雾沉积技术,用于在超高真空下生长有机半导体薄膜。 PL和OD-XAS研究是在四磺化酞菁铜(tsCuPc)和聚环氧乙烷(PEO)的纯膜和混合膜上进行的。仅混合的复合物显示出红外辐射,这是由于薄膜中PEO对tsCuPc的分解所致。

著录项

  • 作者

    McGlynn Andrew G.;

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  • 年度 2010
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  • 原文格式 PDF
  • 正文语种 {"code":"en","name":"English","id":9}
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