In Situ Measurement of Growing Thin Films by Energy Dispersive X-Ray Reflectivity: Theory and Experimental Design

摘要

A method for the in-situ measurement of thin-film growth by x-ray reflectivity is described. Description of the underlying theory is given. Real- time characterization of thickness and roughness variation during growth is possible via this technique. A deposition chamber for the implementation of these measurements has been designed and constructed. This apparatus is described, along with software developed for the purpose of data acquisition and analysis.