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Investigation of electromigration in In2Se3 nanowire for phase change memory devices

机译:In2Se3纳米线中用于相变存储器件的电迁移研究

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摘要

The decomposition of In2Se3 nanowire phase change memory devices during current-driving operation was investigated. The devices were subjected to thermal/electrical stress with current density and electric field during the reset operation at 0.24–0.38 MA/cm2 and 5.3–6.4 kV/cm, respectively. After multiple operation cycles, a change in morphology and composition of the In2Se3 nanowire was observed and led to the device failure. The transmission electron microscopy and energy dispersive analysis indicate that electromigration causes the catastrophic failure by void formation where In atoms migrate toward the cathode and Se atoms migrate toward the anode depending on their electronegativities.
机译:研究了In2Se3纳米线相变存储器件在电流驱动过程中的分解。在重置操作期间,这些设备分别受到电流/密度和电场的热/电应力,电流密度分别为0.24-0.38 MA / cm 2 和5.3-6.4 kV / cm。在多个操作周期后,观察到In2Se3纳米线的形态和组成发生变化,并导致器件故障。透射电子显微镜和能量色散分析表明,电迁移通过形成空隙而导致灾难性破坏,其中In原子向阴极迁移,而Se原子向阳极迁移,这取决于其电负性。

著录项

  • 来源
    《Applied Physics Letters》 |2013年第23期|1-4|共4页
  • 作者单位

    Department of Electrical Engineering, Pohang University of Science and Technology, Pohang, South Korea|c|;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
  • 原文格式 PDF
  • 正文语种 eng
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