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Quasi-two-dimensional electron gas behavior in doped LaAlO3 thin films on SrTiO3 substrates

机译:SrTiO 3 衬底上掺杂LaAlO 3 薄膜的准二维电子气行为

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We have demonstrated the growth of Tm and Lu doped LaAlO3 epitaxial thin films on single crystal (001) SrTiO3 substrates. These rare-earth dopants potentially act as sources of localized moment and spin-orbit scattering centers at the interface. Through structural and chemical characterization, we confirm the incorporation of Tm and Lu dopants into highly crystalline LaAlO3 films. The rare earth doping of the La site does not significantly modify the sheet carrier concentration or mobility compared to undoped samples despite the evolution of sheet carrier concentration, mobility, and sheet resistance with LaAlO3 thickness in undoped LaAlO3 films on SrTiO3.
机译:我们已经证明了Tm和Lu掺杂的LaAlO 3 外延薄膜在单晶(001)SrTiO 3 衬底上的生长。这些稀土掺杂物潜在地充当界面处的局部矩和自旋轨道散射中心的来源。通过结构和化学表征,我们确认将Tm和Lu掺杂剂掺入高度结晶的LaAlO 3 薄膜中。与未掺杂样品相比,La部位的稀土掺杂不会显着改变表面载流子浓度或迁移率,尽管在未掺杂LaAlO 时,LaAlO 3 的厚度会导致表面载流子浓度,迁移率和表面电阻在SrTiO 3 上的inf> 3 薄膜。

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