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Impact of substrate temperature on the structural and optical properties of strain-balanced InAs/InAsSb type-II superlattices grown by molecular beam epitaxy

机译:衬底温度对分子束外延生长的应变平衡InAs / InAsSb II型超晶格的结构和光学性质的影响

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Molecular beam epitaxial growth of strain-balanced InAs/InAs1-xSbx type-II superlattices on GaSb substrates has been investigated for substrate temperatures from 400 °C to 450 °C. The Sb composition is found to vary linearly with substrate temperature at constant V/III ratios. For samples grown at the optimized substrate temperature (410 °C), superlattice zero-order peak full-width at half-maximums are routinely less than 25 arc sec using high-resolution X-ray diffraction. Cross-sectional transmission electron microscopy images show the absence of any visible defects. Strong photoluminescence covers a wavelength range from 5.5 to 13 μm at 12 K. Photoluminescence linewidth simulations show satisfactory agreement with experiments.
机译:研究了GaSb衬底上应变平衡InAs / InAs 1- x Sb x II型超晶格的分子束外延生长的衬底温度从400°C到450°C。发现Sb组成在恒定的V / III比下随衬底温度线性变化。对于在最佳衬底温度(410 C)下生长的样品,使用高分辨率X射线衍射,半晶格处的超晶格零阶峰全宽通常小于25 arc sec。横截面透射电子显微镜图像显示不存在任何可见缺陷。在12 K时,强光致发光的波长范围为5.5至13μm。光致发光线宽模拟表明与实验结果令人满意。

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