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Submonolayer quantum dot quantum cascade long-wave infrared photodetector grown on Ge substrate

机译:CeSonolayer量子点量子级联Ge衬底上生长的长波红外光电探测器

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摘要

A germanium (Ge) or germanium-on-silicon (Ge-on-Si) substrate is an attractive yet not well-studied platform for developing long-wave infrared photonics devices such as lasers and photodetectors. In this paper, we report a long-wave infrared quantum cascade photodetector grown on the Ge substrate with a submonolayer InAs/GaAs quantum dot as the infrared absorber. At 77 K under zero bias, the detector shows a differential-resistance area (R_0A) product of 298.7 Ω·cm~2. The normal-incident peak responsivity is 0.56 mA/W observed at 8.3 μm, corresponding to a Johnson noise limited detectivity of 1.5 × 10~8cm·Hz~(1/2)/W. In addition, the effect of the periodic stage number of active regions on device's performance is discussed in detail. The device characteristics presented in this work demonstrate the potential for monolithic integration of this quantum cascade detector with the Ge or Ge-on-Si substrate for large-scale, cost-effective sensing and imaging applications.
机译:锗(GE)或硅锗(GE-ON-SI)衬底是一种吸引人的尚未得到很好的研究,用于开发诸如激光和光电探测器的长波红外光子件装置。在本文中,我们报告了在GE基板上生长的长波红外量子级联光电探测器,其具有子组衬底/ GaAs量子点作为红外吸收器。在零偏压下以77 k处,检测器显示差分电阻区域(R_0a)乘积为298.7Ω·cm〜2。正常入射的峰值响应性为0.56 mA / W,观察到8.3μm,对应于约翰逊噪声限制探测器为1.5×10〜8cm·Hz〜(1/2)/ w。此外,详细讨论了在设备性能上的周期性阶段数量对设备性能的影响。本作工作中提供的器件特性证明了这种量子级联检测器与GE或GE-ON-SI基板的单片集成的可能性,用于大规模,具有成本高效的感测和成像应用。

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  • 来源
    《Applied Physics Letters》 |2021年第8期|081102.1-081102.5|共5页
  • 作者单位

    School of Information Science and Technology ShanghaiTech University Shanghai 201210 China Shanghai Institute of Microsystem and Information Technology Chinese Academy of Sciences Shanghai 200050 China University of Chinese Academy of Sciences Beijing 100049 China;

    School of Information Science and Technology ShanghaiTech University Shanghai 201210 China;

    Shanghai Institute of Microsystem and Information Technology Chinese Academy of Sciences Shanghai 200050 China;

    School of Information Science and Technology ShanghaiTech University Shanghai 201210 China;

    Shanghai Institute of Microsystem and Information Technology Chinese Academy of Sciences Shanghai 200050 China;

    School of Information Science and Technology ShanghaiTech University Shanghai 201210 China;

    School of Information Science and Technology ShanghaiTech University Shanghai 201210 China;

    Shanghai Institute of Microsystem and Information Technology Chinese Academy of Sciences Shanghai 200050 China;

    School of Information Science and Technology ShanghaiTech University Shanghai 201210 China;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
  • 原文格式 PDF
  • 正文语种 eng
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