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Contacts to p-type ZnMgO

机译:p型ZnMgO的触点

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Ohmic and Schottky contacts to p-type Zn_(0.9)Mg_(0.1)O are reported. The lowest specific contact resistivity of 3×10~(-3) Ω cm~(2) was obtained for Ti/Au annealed at 600℃ for 30 s. Ni/Au was less thermally stable and showed severe degradation of contact morphology at this annealing temperature. Both Pt and Ti with Au overlayers showed rectifying characteristics on p-ZnMgO, with barrier heights of ~0.55-0.56 eV and ideality factors of ~1.9. Comparison of these results with the same metals on n-type ZnO indicates that high surface state densities play a significant role in determining the effective barrier height.
机译:据报道与p型Zn_(0.9)Mg_(0.1)O的欧姆和肖特基接触。在600℃退火30 s的Ti / Au合金的最低比接触电阻率为3×10〜(-3)Ωcm〜(2)。 Ni / Au的热稳定性较差,并且在此退火温度下显示出严重的接触形态退化。带有Au覆盖层的Pt和Ti在p-ZnMgO上均表现出整流特性,势垒高度为〜0.55-0.56 eV,理想因子为〜1.9。这些结果与n型ZnO上相同金属的比较表明,高表面态密度在确定有效势垒高度方面起着重要作用。

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