首页> 外文会议>International Conference on Materials Science and Engineering >p-type field effect transistor and UV-photoconductive characteristics of Na doped ZnMgO thin films
【24h】

p-type field effect transistor and UV-photoconductive characteristics of Na doped ZnMgO thin films

机译:p型场效应晶体管和Na掺杂Znmgo薄膜的UV光电导特性

获取原文

摘要

In this study, the authors have presented results for fabricated ZnO based FET and the UV-photoconductive characteristics of Na doped ZnMgO thin films. The electrical measurements confirmed that the conductivity of the Na doped ZnMgO thin film is p-type, and the carrier mobility was estimated to be 2.3 cm~2V~(-1)S~(-1). Moreover, after exposed to the 365 nm ultraviolet light, the Na doped ZnMgO thin films still exhibited p-type behavior under gate voltage ranging from -5 to 2 V, and the Id increased a little while the carrier mobility did not change much. The photocurrent was measured under a bias of 6 V in air at room temperature. The films performed a higher current intensity after the illumination. The instantaneous rise of the photocurrent was completed when exposed to the 365 nm ultraviolet for 20 s, after switching the ultraviolet off the photocurrent decayed in a slower rate. The enhance rate of photocurrent was about 1.33%. Conclusively, Na is a considerable acceptor dopant for making high quality p-type ZnO films, and the tiny change in the photocurrent of p-type Na doped ZnMgO thin film made it relatively stable when fabricating LEDs and other optoelectronic devices.
机译:在这项研究中,作者呈现了制造的ZnO基FET的结果和Na掺杂ZnMGO薄膜的UV光电导特性。电测量证实,Na掺杂的ZnMGO薄膜的电导率是p型,并且估计载流子迁移率为2.3cm〜2V〜(-1)S〜(-1)。此外,在暴露于365nm紫外光之后,Na掺杂的ZnMGO薄膜仍然在-5至2V的栅极电压下表现出p型行为,并且该ID增加一时载流子迁移率没有变化。在室温下在空气中的6V的偏压下测量光电流。薄膜在照明后进行更高的电流强度。在将紫外线切断以较慢的速率衰减的情况下,在将光电流暴露于365nm紫外线时完成光电流的瞬时升高。增强率的光电流约为1.33%。结论,NA是制造高质量的p型ZnO膜的相当大的受体掺杂剂,并且在制造LED和其他光电器件时,P型Na掺杂ZnMGO薄膜的光电流的微小变化使其相对稳定。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号