...
首页> 外文期刊>Materials Letters >Preparation and photoluminescent properties of p-type Li-doped ZnMgO thin films
【24h】

Preparation and photoluminescent properties of p-type Li-doped ZnMgO thin films

机译:p型掺锂ZnMgO薄膜的制备及光致发光性能

获取原文
获取原文并翻译 | 示例
           

摘要

p-type Li-doped ZnMgO thin films were prepared on glass substrates by pulsed laser deposition. The growth temperature varied from 400 to 650℃. All the films were highly c-axis oriented according to X-ray diffraction patterns. Hall-effect measurements indicated that the Li-doped ZnMgO film grown above 600℃ failed in converting to p-type conduction. The film grown at 550℃ showed the lowest resistivity of 10Ω cm with a hole concentration of 2.5 × 10~(18)cm~(-3). Temperature-dependent PL measurements revealed a dominant emission at 3.52eV up to RT, which may be assigned as exciton bound to neutral-acceptor (A~0X) due to Li-doping. The Li acceptor activation energy in ZnMgO thin film was determined to be 135 ± 20meV.
机译:通过脉冲激光沉积在玻璃基板上制备了p型掺杂Li的ZnMgO薄膜。生长温度从400℃到650℃不等。根据X射线衍射图,所有膜都高度c轴取向。霍尔效应测试表明,在600℃以上生长的掺Li的ZnMgO薄膜未能转变为p型导电。在550℃下生长的薄膜的最低电阻率为10Ωcm,空穴浓度为2.5×10〜(18)cm〜(-3)。随温度变化的PL测量结果显示,直到RT,在3.52eV处有一个主要发射,这可能归因于由于掺杂锂而与中性受体(A〜0X)结合的激子。测得ZnMgO薄膜中的Li受体活化能为135±20meV。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号