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首页> 外文期刊>Applied Physics Letters >Electroreflectance studies of InAs quantum dots with In_xGa_(1-x)As capping layer grown by metalorganic chemical vapor deposition
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Electroreflectance studies of InAs quantum dots with In_xGa_(1-x)As capping layer grown by metalorganic chemical vapor deposition

机译:金属有机化学气相沉积生长具有In_xGa_(1-x)As覆盖层的InAs量子点的电反射研究

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摘要

Electroreflectance spectroscopy was used to study the effect of In_xGa_(1-x)As capping layer on InAs quantum dots grown by metalorganic chemical vapor deposition. The optical transitions of the quantum dots and the In_xGa_(1-x)As capping layer were well resolved. The energy shifts in the In_xGa_(1-x)As capping layer show a different trend as compared to a series of referent In_xGa_(1-x)As quantum wells. These results support the concept of strain-driven alloy decomposition during the In_xGa_(1-x)As layer overgrowth.
机译:用电反射光谱法研究了In_xGa_(1-x)As覆盖层对金属有机化学气相沉积生长的InAs量子点的影响。量子点和In_xGa_(1-x)As覆盖层的光学跃迁已得到很好的解决。与一系列参考In_xGa_(1-x)As量子阱相比,In_xGa_(1-x)As覆盖层中的能量转移显示出不同的趋势。这些结果支持了In_xGa_(1-x)As层过度生长过程中应变驱动合金分解的概念。

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