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Field emission of silicon nanowires

机译:硅纳米线的场发射

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Field emission of single crystal silicon nanowires of 100 nm in diameter grown at 480℃ from silane using Au as catalyst has been investigated. An emission current density of 1 mA/cm~2 over a 0.2 cm~2 area was obtained at an electric field of 3.4 V/蘭 with a turn-on field of 2 V/μm at 0.01 mA/cm~2. The annealing of the as-grown samples at 550℃ in vacuum has drastically improved the field emission performance. The low growth and annealing temperatures make the process applicable to glass substrates.
机译:以Au为催化剂,研究了硅烷在480℃下生长的直径为100 nm的单晶硅纳米线的场致发射。在3.4 V /兰的电场下,在0.01 mA / cm〜2的开通电场为2 V /μm的情况下,在0.2 cm〜2的面积上可获得1 mA / cm〜2的发射电流密度。初生样品在550℃的真空中退火大大改善了场发射性能。低的生长和退火温度使该方法适用于玻璃基板。

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