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Effect of electromigration in the anodic Al interconnect on melting of flip chip solder joints

机译:阳极铝互连中的电迁移对倒装芯片焊点熔化的影响

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摘要

Melting of eutectic SnPb flip chip solder joints has been observed to occur frequently in dc electromigration tested with current density above 1.5 X 10~4 A/cm~2 at an ambient temperature of 100℃. It has been found that it is not due to the Joule heating of the solder bump itself, but rather due to the Joule heating of the on-chip Al interconnects. The current density in the Al approaches 2 X 10~6 A/cm~2 and electromigration has especially generated voids at the anode of the Al. The damage has greatly increased the resistance of the Al, which produces the heat needed to melt the solder joint. The results of electrothermal coupling analysis show that when the resistance of the Al line changed threefold, the solder bump melted.
机译:在100℃的环境温度下,在电流密度超过1.5 X 10〜4 A / cm〜2的直流电迁移测试中,共晶SnPb倒装芯片焊点经常发生熔化。已经发现,这不是由于焊料凸块本身的焦耳热,而是由于芯片上的Al互连的焦耳热。 Al中的电流密度接近2 X 10〜6 A / cm〜2,电迁移尤其在Al的阳极上产生空隙。损坏大大增加了Al的电阻,Al产生了熔化焊点所需的热量。电热耦合分析的结果表明,当Al线的电阻变化三倍时,焊料凸点熔化。

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