Sub-30-nm patterning on quartz for imprint lithography templates

摘要

A parallel and economical method for obtaining nanoscale features on large-area quartz substrates has been developed for use in nanoimprint lithography template fabrication. Self-assembled multilayer films (molecular rulers) are used in conjunction with photolithographically defined metallic features to generate precise nanogaps with sub-30-nm resolution on quartz substrates. These nanopatterns are then transferred to the quartz substrates using the metallic thin films as etch masks.