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首页> 外文期刊>Applied Physics Letters >Multilayer mirror with enhanced spectral selectivity for the next generation extreme ultraviolet lithography
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Multilayer mirror with enhanced spectral selectivity for the next generation extreme ultraviolet lithography

机译：具有增强的光谱选择性的多层反射镜，适用于下一代极紫外光刻

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摘要

We have demonstrated a hybrid extreme ultraviolet (EUV) multilayer mirror for 6.x nm radiation that provides selective suppression for infrared (IR) radiation. The mirror consists of an IR-transparent LaN/B multilayer stack which is used as EUV-reflective coating and antireflective (AR) coating to suppress IR. The AR coating can be optimized to suppress CO_2 laser radiation at the wavelength of 10.6 μm, which is of interest for application in next-generation EUV lithography systems.
机译：我们已经证明了用于6.x nm辐射的混合极紫外（EUV）多层反射镜可以为红外（IR）辐射提供选择性抑制。该反射镜由红外透明的LaN / B多层堆叠组成，该堆叠用作EUV反射涂层和抗反射（AR）涂层以抑制IR。可以对AR涂层进行优化，以抑制波长为10.6μm的CO_2激光辐射，这在下一代EUV光刻系统中很有意义。

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  • 来源
    《Applied Physics Letters》 |2013年第22期|221114.1-221114.4|共4页
  • 作者

    V. V. Medvedev; R. W. E. van de Kruijs; A. E. Yakshin; N. N. Novikova; V. M. Krivtsun; E. Louis; A. M. Yakunin; F. Bijkerk;

  • 作者单位

    FOM Dutch Institute for Fundamental Energy Research (DIFFER), P.O. Box 1207, 3430 BE Nieuwegein, The Netherlands;

    FOM Dutch Institute for Fundamental Energy Research (DIFFER), P.O. Box 1207, 3430 BE Nieuwegein, The Netherlands;

    FOM Dutch Institute for Fundamental Energy Research (DIFFER), P.O. Box 1207, 3430 BE Nieuwegein, The Netherlands;

    Institute for Spectroscopy RAS, Fizicheskaya str. 5, Troitsk, Moscow 142190, Russia;

    Institute for Spectroscopy RAS, Fizicheskaya str. 5, Troitsk, Moscow 142190, Russia;

    FOM Dutch Institute for Fundamental Energy Research (DIFFER), P.O. Box 1207, 3430 BE Nieuwegein, The Netherlands ,MESA+Institute for Nanotechnology, University of Twente, P.O. Box 217, 7500 AE Enschede, The Netherlands;

    ASML, De Run 6501, 5504 DR Veldhoven, The Netherlands;

    FOM Dutch Institute for Fundamental Energy Research (DIFFER), P.O. Box 1207, 3430 BE Nieuwegein, The Netherlands ,MESA+Institute for Nanotechnology, University of Twente, P.O. Box 217, 7500 AE Enschede, The Netherlands;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
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