机译:在不同真空环境下,高通量极紫外光照射下,极紫外光刻光学多层反射镜反射率的非线性行为
Laboratory of Advanced Science and Technology for Industry, University of Hyogo, Kamigori, Hyogo 678.1205, Japan;
Laboratory of Advanced Science and Technology for Industry, University of Hyogo, Kamigori, Hyogo 678.1205, Japan,Precision Equipment Company, Nikon Corporation, Sagamihara 228-0828, Japan;
Laboratory of Advanced Science and Technology for Industry, University of Hyogo, Kamigori, Hyogo 678.1205, Japan,Precision Equipment Company, Nikon Corporation, Sagamihara 228-0828, Japan;
Nanotechnotogy Development Center, Canon Inc., Utsunomiya 321-3298, Japan;
Nanotechnotogy Development Center, Canon Inc., Utsunomiya 321-3298, Japan;
Nanotechnotogy Development Center, Canon Inc., Utsunomiya 321-3298, Japan;
Nanotechnotogy Development Center, Canon Inc., Utsunomiya 321-3298, Japan;
Precision Equipment Company, Nikon Corporation, Sagamihara 228-0828, Japan;
Precision Equipment Company, Nikon Corporation, Sagamihara 228-0828, Japan;
Precision Equipment Company, Nikon Corporation, Sagamihara 228-0828, Japan;
机译:新SUBARU中用于极端紫外线平版镜污染的新型极端紫外线照射和多层评估系统
机译:在水,氧气或氧气/臭氧混合物的存在下通过极紫外辐射抑制碳生长并去除极紫外光刻镜上的碳沉积物
机译:乙醇抑制Ru覆盖的多层反射镜对极紫外光刻光刻光学的污染
机译:改进的Ru / Si多层反射涂层,用于先进的极端紫外光刻光掩模
机译:强烈的毛细管放电等离子体极紫外光源,用于极紫外光刻和其他极紫外成像应用。
机译:高通量超快极紫外光发射光谱脉冲重复频率为18.4 MHz
机译:极端紫外线光刻的多层反射涂层