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Synchrotron-based investigation of transition-metal getterability in n-type multicrystalline silicon

机译:基于同步加速器的n型多晶硅中过渡金属吸收性研究

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摘要

Solar cells based on n-type multicrystalline silicon (mc-Si) wafers are a promising path to reduce the cost per kWh of photovoltaics; however, the full potential of the material and how to optimally process it are still unknown. Process optimization requires knowledge of the response of the metal-silicide precipitate distribution to processing, which has yet to be directly measured and quantified. To supply this missing piece, we use synchrotron-based micro-X-ray fluorescence (μ-XRF) to quantitatively map >250 metal-rich particles in n-type mc-Si wafers before and after phosphorus diffusion gettering (PDG). We find that 820 ℃ PDG is sufficient to remove precipitates of fast-diffusing impurities and that 920 ℃ PDG can eliminate precipitated Fe to below the detection limit of μ-XRF. Thus, the evolution of precipitated metal impurities during PDG is observed to be similar for n- and p-type mc-Si, an observation consistent with calculations of the driving forces for precipitate dissolution and segregation gettering. Measurements show that minority-carrier lifetime increases with increasing precipitate dissolution from 820 ℃ to 880℃ PDG, and that the lifetime after PDG at 920 ℃ is between the lifetimes achieved after 820 ℃ and 880℃ PDG.
机译:基于n型多晶硅(mc-Si)晶片的太阳能电池是降低光伏每kWh成本的有前途的途径。然而,材料的全部潜力以及如何对其进行最佳处理仍是未知的。工艺优化需要了解金属硅化物沉淀物分布对加工的响应,但尚未直接进行测量和量化。为了提供此缺失的部件,我们使用基于同步加速器的微X射线荧光(μ-XRF)来定量映射磷扩散吸收(PDG)之前和之后的n型mc-Si晶片中的> 250个富金属颗粒。我们发现820℃PDG足以去除快速扩散杂质的沉淀物,而920℃PDG可以将沉淀出的Fe消除到μ-XRF的检测极限以下。因此,对于n型和p型mc-Si,观察到PDG期间析出的金属杂质的演变是相似的,这一观察结果与沉淀物溶解和偏析吸气的驱动力的计算一致。测量表明,从820℃到880℃PDG,随着析出物溶解度的增加,少数载流子的寿命增加,而在920℃下PDG的寿命介于820℃和880℃PDG的寿命之间。

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  • 来源
    《Applied Physics Letters》 |2016年第20期|202104.1-202104.5|共5页
  • 作者单位

    Massachusetts Institute of Technology, Cambridge, Massachusetts 02139, USA;

    Massachusetts Institute of Technology, Cambridge, Massachusetts 02139, USA;

    Massachusetts Institute of Technology, Cambridge, Massachusetts 02139, USA;

    Massachusetts Institute of Technology, Cambridge, Massachusetts 02139, USA;

    Supreme Inc., Sunnyvale, California 94085, USA;

    Advanced Photon Source, Argonne National Laboratory, Argonne, Illinois 60439, USA;

    Massachusetts Institute of Technology, Cambridge, Massachusetts 02139, USA,University of California, San Diego, La Jolla, California 92093, USA;

    Massachusetts Institute of Technology, Cambridge, Massachusetts 02139, USA;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
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  • 正文语种 eng
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