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机译:使用在斜角4H-SiC衬底上生长的3C-SiC外延层产生氢的光电阴极
Department of Engineering Physics, Electronics and Mechanics, Nagoya Institute of Technology, Nagoya 466-8555, Japan;
Department of Engineering Physics, Electronics and Mechanics, Nagoya Institute of Technology, Nagoya 466-8555, Japan;
Department of Engineering Physics, Electronics and Mechanics, Nagoya Institute of Technology, Nagoya 466-8555, Japan;
机译:抑制具有邻角的4H-SiC Si面基板上产生的短步成束
机译:4H-SiC衬底上具有邻角倾斜的外延层生长过程中基面位错向螺纹边缘位错的转换
机译:倾斜角小于1°的衬底上4H-SiC同质外延生长
机译:在相邻的4H-SiC衬底上生长的gan薄外延层中的缺陷产生的发射
机译:AlN,4H-SiC,3C-SiC和ZrB2衬底上磷化硼的外延。
机译:在单晶MgO(001)基底上生长的FeRh外延层中基底诱导的应变场
机译:具有邻近(1°)偏角的C(000-1)外延衬底上制作的4H-siC mOsFET的高反型沟道迁移率
机译:siC衬底上生长的外延3C-siC,4H-siC和6H-siC薄膜缺陷的研究