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首页> 外文期刊>Applied physics express >Photocathode for hydrogen generation using 3C-SiC epilayer grown on vicinal off-angle 4H-SiC substrate
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Photocathode for hydrogen generation using 3C-SiC epilayer grown on vicinal off-angle 4H-SiC substrate

机译:使用在斜角4H-SiC衬底上生长的3C-SiC外延层产生氢的光电阴极

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摘要

We employed a 3C-SiC epilayer grown on a vicinal off-angle 4H-SiC substrate as a photocathode. The presence of 3C-SiC on the surface of this epilayer was confirmed by optical microscopy and Raman spectroscopy. Spectral responses of the photocathode show high quantum efficiencies in a wide wavelength range. By illuminating the photocathode with full-spectrum solar light of 1.1 W/cm~2, the photocurrent was determined to be -13.5mA/cm~2 with a Ni counterelectrode. The generated hydrogen volumes were much larger than those reported previously for SiC photocathodes.
机译:我们采用了在邻近倾斜的4H-SiC衬底上生长的3C-SiC外延层作为光电阴极。通过光学显微镜和拉曼光谱证实了该外延层表面上3C-SiC的存在。光电阴极的光谱响应在很宽的波长范围内显示出很高的量子效率。通过用1.1W / cm〜2的全光谱太阳光照射光电阴极,用Ni对电极确定光电流为-13.5mA / cm〜2。产生的氢气量比以前报道的SiC光电阴极大得多。

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  • 来源
    《Applied physics express》 |2015年第9期|091301.1-091301.3|共3页
  • 作者单位

    Department of Engineering Physics, Electronics and Mechanics, Nagoya Institute of Technology, Nagoya 466-8555, Japan;

    Department of Engineering Physics, Electronics and Mechanics, Nagoya Institute of Technology, Nagoya 466-8555, Japan;

    Department of Engineering Physics, Electronics and Mechanics, Nagoya Institute of Technology, Nagoya 466-8555, Japan;

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