首页> 外文期刊>Advanced Materials >Suppressing Interface Strain for Eliminating Double-Slope Behaviors: Towards Ideal Conformable Polymer Field-Effect Transistors
【24h】

Suppressing Interface Strain for Eliminating Double-Slope Behaviors: Towards Ideal Conformable Polymer Field-Effect Transistors

机译:抑制用于消除双斜率行为的界面应变:朝向理想的适形聚合物场效应晶体管

获取原文
获取原文并翻译 | 示例
           

摘要

High-mobility polymer field-effect transistors (PFETs) are being actively explored for applications in soft electronic skin and low-cost flexible displays because of their superior solution processability, mechanical flexibility, and stretchability. However, most of high-mobility PFETs often deviate from the idealized behavior with variable mobility, large threshold voltage, and high off-state current, which masks their intrinsic properties and significantly impedes their practical applications. Here, it is first revealed that interface strain between polymer thin film and rigid substrate plays a crucial role in determining the ideality of PFETs, and demonstrate that various ideal conformable PFETs can be successfully fabricated by releasing strain. It is found that strain in film can be released by one-step peeling strategy, which can reduce pi-pi stacking distance and suppress generation of oxygen doped carriers, thereby obtaining linearly injected charge carriers and decreased carrier concentration in channel, eventually realizing ideal PFETs. More impressively, the fabricated ideal conformable PFET array displays outstanding conformability to curved objects, and meanwhile showing excellent organic light-emitting display driving capability. The work clarifies the effect of the interface strain on the device ideality, and strain can be effectively released by a facile peeling strategy, thus offering useful guidance for the construction of ideal conformable PFETs.
机译:高迁移率聚合物场效应晶体管(PFET)正在积极探索软电子皮肤和低成本柔性显示器的应用,因为它们的溶液加工性,机械柔韧性和拉伸性。然而,大多数高迁移率PFET通常偏离具有可变移动性,大阈值电压和高通电电流的理想化行为,这些行为掩盖了它们的内在特性并显着地阻碍了其实际应用。这里,首先揭示了聚合物薄膜和刚性基板之间的界面应变在确定PFET的理想方面起着至关重要的作用,并且证明可以通过释放菌株来成功制造各种理想的合格性PFET。发现薄膜中的应变可以通过一步剥离策略释放,这可以减少PI-PI堆叠距离和抑制氧气掺杂载体的产生,从而获得线性注入的电荷载流子并降低通道中的载波浓度,最终实现理想的PFET 。更令人印象深刻地,所制作的理想的适形PFET阵列显示出弯曲物体的出色顺从性,同时显示出优异的有机发光显示驱动能力。该工作阐明了界面应变对器件理想度的影响,并且可以通过容易的剥离策略有效地释放应变,从而为理想的适形PFET提供有用的指导。

著录项

  • 来源
    《Advanced Materials》 |2021年第44期|2101633.1-2101633.10|共10页
  • 作者单位

    Northeast Normal Univ Ctr Adv Optoelect Funct Mat Res Changchun 130024 Peoples R China|Northeast Normal Univ Key Lab UV Emitting Mat & Technol Minist Educ Changchun 130024 Peoples R China;

    Northeast Normal Univ Ctr Adv Optoelect Funct Mat Res Changchun 130024 Peoples R China|Northeast Normal Univ Key Lab UV Emitting Mat & Technol Minist Educ Changchun 130024 Peoples R China;

    Northeast Normal Univ Ctr Adv Optoelect Funct Mat Res Changchun 130024 Peoples R China|Northeast Normal Univ Key Lab UV Emitting Mat & Technol Minist Educ Changchun 130024 Peoples R China;

    Northeast Normal Univ Ctr Adv Optoelect Funct Mat Res Changchun 130024 Peoples R China|Northeast Normal Univ Key Lab UV Emitting Mat & Technol Minist Educ Changchun 130024 Peoples R China;

    Northeast Normal Univ Ctr Adv Optoelect Funct Mat Res Changchun 130024 Peoples R China|Northeast Normal Univ Key Lab UV Emitting Mat & Technol Minist Educ Changchun 130024 Peoples R China;

    Northeast Normal Univ Ctr Adv Optoelect Funct Mat Res Changchun 130024 Peoples R China|Northeast Normal Univ Key Lab UV Emitting Mat & Technol Minist Educ Changchun 130024 Peoples R China;

    Northeast Normal Univ Ctr Adv Optoelect Funct Mat Res Changchun 130024 Peoples R China|Northeast Normal Univ Key Lab UV Emitting Mat & Technol Minist Educ Changchun 130024 Peoples R China;

    Northeast Normal Univ Ctr Adv Optoelect Funct Mat Res Changchun 130024 Peoples R China|Northeast Normal Univ Key Lab UV Emitting Mat & Technol Minist Educ Changchun 130024 Peoples R China;

    Northeast Normal Univ Ctr Adv Optoelect Funct Mat Res Changchun 130024 Peoples R China|Northeast Normal Univ Key Lab UV Emitting Mat & Technol Minist Educ Changchun 130024 Peoples R China;

    Chinese Acad Sci Changchun Inst Appl Chem Changchun 130022 Peoples R China;

    Northeast Normal Univ Ctr Adv Optoelect Funct Mat Res Changchun 130024 Peoples R China|Northeast Normal Univ Key Lab UV Emitting Mat & Technol Minist Educ Changchun 130024 Peoples R China;

    Northeast Normal Univ Ctr Adv Optoelect Funct Mat Res Changchun 130024 Peoples R China|Northeast Normal Univ Key Lab UV Emitting Mat & Technol Minist Educ Changchun 130024 Peoples R China;

    Northeast Normal Univ Ctr Adv Optoelect Funct Mat Res Changchun 130024 Peoples R China|Northeast Normal Univ Key Lab UV Emitting Mat & Technol Minist Educ Changchun 130024 Peoples R China;

  • 收录信息
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

    conformable transistors; double-slope behaviors; idealized behaviors; polymer field-effect transistors; strains;

    机译:适形晶体管;双斜率行为;理想化的行为;聚合物场效应晶体管;菌株;

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号