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首页> 外文期刊>Advanced Materials >A Low-Temperature, Solution-Processable, Cu-Doped Nickel Oxide Hole-Transporting Layer via the Combustion Method for High-Performance Thin-Film Perovskite Solar Cells
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A Low-Temperature, Solution-Processable, Cu-Doped Nickel Oxide Hole-Transporting Layer via the Combustion Method for High-Performance Thin-Film Perovskite Solar Cells

机译:高性能薄膜钙钛矿太阳能电池燃烧方法的低温,固溶处理,Cu掺杂的氧化镍空穴传输层

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摘要

Low-temperature, solution-processable Cu-doped NiOX (Cu:NiOx), prepared via combustion chemistry, is demonstrated as an excellent hole-transporting layer (HTL) for thin-film perovskite solar cells (PVSCs). Its good crystallinity, conductivity, and hole-extraction properties enable the derived PVSC to have a high power conversion efficiency (PCE) of 17.74%. Its general applicability for various elecrode materials is also revealed.
机译:通过燃烧化学方法制备的低温可固溶处理的掺杂Cu的NiOX(Cu:NiOx)被证明是用于薄膜钙钛矿太阳能电池(PVSC)的极好的空穴传输层(HTL)。其良好的结晶度,导电性和空穴提取性能使衍生的PVSC具有17.74%的高功率转换效率(PCE)。还揭示了其在各种电极材料中的普遍适用性。

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  • 来源
    《Advanced Materials》 |2015年第47期|7874-7880|共7页
  • 作者单位

    Univ Washington, Dept Mat Sci & Engn, Seattle, WA 98195 USA;

    Univ Washington, Dept Mat Sci & Engn, Seattle, WA 98195 USA;

    Univ Washington, Dept Mat Sci & Engn, Seattle, WA 98195 USA|Univ Washington, Dept Chem, Seattle, WA 98195 USA;

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  • 正文语种 eng
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