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首页> 外文期刊>Advanced Functional Materials >Controllable Shifts in Threshold Voltage of Top-Gate Polymer Field-Effect Transistors for Applications in Organic Nano Floating Gate Memory
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Controllable Shifts in Threshold Voltage of Top-Gate Polymer Field-Effect Transistors for Applications in Organic Nano Floating Gate Memory

机译:用于有机纳米浮栅存储器的顶栅聚合物场效应晶体管阈值电压的可控偏移

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摘要

Organic field-effect transistor (FET) memory is an emerging technology with the potential to realize light-weight, low-cost, flexible charge storage media. Here, solution-processed poly[9,9-dioctylfluorenyl-2,7-diyl]-co-(bithiophene)J (F8T2) nano floating gate memory (NFGM) with a top-gate/bottom-contact device configuration is reported. A reversible shift in the threshold voltage (V_(Th)) and reliable memory characteristics was achieved by the incorporation of thin Au nanoparticles (NPs) as charge storage sites for negative charges (electrons) at the interface between polystyrene and cross-linked poly(4-vinylphenol). The F8T2 NFGM showed relatively high field-effect mobility (μ_(FET)) (0.02 cm~2 V~(-1) s~(-1)) for an amorphous semiconducting polymer with a large memory window (ca. 30 V), a high on/off ratio (more than 10~4) during writing and erasing with an operation voltage of 80 V of gate bias in a relatively short timescale (less than 1s), and a retention time of a few hours. This top-gated polymer NFGM could be used as an organic transistor memory element for organic flash memory.
机译:有机场效应晶体管(FET)存储器是一项新兴技术,具有实现轻便,低成本,灵活的电荷存储介质的潜力。在这里,报道了具有顶栅/底接触器件配置的溶液处理的聚[9,9-二辛基芴基-2,7-二基] -co-(联噻吩)J(F8T2)纳米浮栅存储器(NFGM)。阈值电压(V_(Th))的可逆移动和可靠的存储特性是通过在聚苯乙烯和交联的聚()交界处加入薄金纳米颗粒(NPs)作为负电荷(电子)的电荷存储位点而实现的4-乙烯基苯酚)。 F8T2 NFGM对于具有大存储窗口(约30 V)的非晶半导体聚合物显示出较高的场效应迁移率(μ_(FET))(0.02 cm〜2 V〜(-1)s〜(-1)) ,在相对较短的时间范围内(小于1s),以80 V的栅极偏置电压工作时,在写入和擦除过程中的高开/关比(大于10〜4)。这种顶部浇口的聚合物NFGM可用作有机闪存的有机晶体管存储元件。

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  • 来源
    《Advanced Functional Materials》 |2010年第2期|224-230|共7页
  • 作者单位

    Convergence Components and Materials Research Laboratory Electronics and Telecommunications Research Institute (ETRI) 161 Cajeong-dong, Yuseong-gu, Daejeon 305-350 (Republic of Korea) Heeger Center for Advanced Materials Department of Materials Science and Engineering Gwangju Institute of Science and Technology (GIST) 261 Cheomdan-gwagiro (Oryong-dong), Buk-gu, Gwangju 500-712 (Republic of Korea);

    Convergence Components and Materials Research Laboratory Electronics and Telecommunications Research Institute (ETRI) 161 Cajeong-dong, Yuseong-gu, Daejeon 305-350 (Republic of Korea) Department of Chemical Engineering Hanbat National University San 16-1, Dukmyung-dong, Yuseong-gu, Daejeon 305-719(Republic of Korea);

    Cavendish Laboratory Department of Physics University of Cambridge J. J. Thomson Avenue, Cambridge CB3 0HE (UK);

    Heeger Center for Advanced Materials Department of Materials Science and Engineering Gwangju Institute of Science and Technology (GIST) 261 Cheomdan-gwagiro (Oryong-dong), Buk-gu, Gwangju 500-712 (Republic of Korea);

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