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Theoretical and Experimental Study of 13.4 kV/55 A SiC PiN Diodes with an Improved Trade-Off between Blocking Voltage and Differential On-Resistance

机译:13.4 kV / 55 A SiC PiN二极管的理论和实验研究其在闭锁电压和差分导通电阻之间取得了较好的折衷

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摘要

In this paper, a 13.4 kV/55 A 4H-silicon carbide (SiC) PiN diode with a better trade-off between blocking voltage, differential on-resistance, and technological process complexity has been successfully developed. A multiple zone gradient modulation field limiting ring (MGM-FLR) for extremely high-power handling applications was applied and investigated. The reverse blocking voltage of 13.4 kV, close to 95% of the theoretical value of parallel plane breakdown voltage, was obtained at a leakage current of 10 μA for a 100 μm thick, lightly doped, 5 × 10 cm n-type SiC epitaxial layer. Meanwhile, a fairly low differential on-resistance of 2.5 mΩ·cm at 55 A forward current (4.1 mΩ·cm at a current density of 100 A/cm ) was calculated for the fabricated SiC PiN with 0.1 cm active area. The highest Baliga’s figure-of-merit (BFOM) of 72 GW/cm was obtained for the fabricated SiC PiN diode. Additionally, the dependence of the breakdown voltage on transition region width, number of rings in each zone, as well as the junction-to-ring spacing of SiC PiN diodes is also discussed. Our findings indicate that this proposed device structure is one potential candidate for an ultra-high voltage power system, and it represents an option to maximize power density and reduce system complexity.
机译:本文成功开发了一种13.4 kV / 55 A 4H碳化硅(SiC)PiN二极管,该二极管在阻断电压,差分导通电阻和工艺过程复杂性之间取得了较好的折衷。应用并研究了用于极高功率处理应用的多区域梯度调制场限制环(MGM-FLR)。对于100μm厚,轻掺杂,5×10 cm的n型SiC外延层,在泄漏电流为10μA时,获得了13.4 kV的反向阻断电压,接近平行平面击穿电压理论值的95%。 。同时,对于制造的具有0.1 cm有源面积的SiC PiN,计算了在55 A正向电流下2.5mΩ·cm的相当低的导通电阻(在100 A / cm的电流密度下为4.1mΩ·cm)。所制造的SiC PiN二极管的最高Baliga品质因数(BFOM)为72 GW / cm。此外,还讨论了击穿电压对过渡区宽度,每个区域中的环数以及SiC PiN二极管的结环间距的依赖性。我们的发现表明,这种拟议的器件结构是超高压电源系统的一种潜在候选,它代表了最大化功率密度和降低系统复杂性的一种选择。

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