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Formation Mechanisms of InGaAs Nanowires Produced by a Solid-Source Two-Step Chemical Vapor Deposition

机译:固源两步化学气相沉积法制备InGaAs纳米线的形成机理

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摘要

The morphologies and microstructures of Au-catalyzed InGaAs nanowires (NWs) prepared by a two-step solid-source chemical vapor deposition (CVD) method were systematically investigated using scanning electron microscopy (SEM) and high-resolution transmission electron microscopy (HRTEM). The detailed structural characterization and statistical analysis reveal that two specific morphologies are dominant in InGaAs NWs, a zigzag surface morphology and a smooth surface morphology. The zigzag morphology results from the periodic existence of twining structures, and the smooth morphology results from a lack of twining structures. HRTEM images and energy-dispersive X-ray spectroscopy (EDX) indicate that the catalyst heads have two structures, Au4In and AuIn2, which produce InGaAs NWs in a cubic phase crystalline form. The growth mechanism of the InGaAs NWs begins with Au nanoparticles melting into small spheres. In atoms are diffused into the Au spheres to form an Au-In alloy. When the concentration of In inside the alloy reaches its saturation point, the In precipitate reacts with Ga and As atoms to form InGaAs at the interface between the catalyst and substrate. Once the InGaAs compound forms, additional precipitation and reactions only occur at the interface of the InGaAs and the catalyst. These results provide a fundamental understanding of the InGaAs NW growth process which is critical to the formation of high-quality InGaAs NWs for various device applications.Electronic supplementary materialThe online version of this article (10.1186/s11671-018-2685-0) contains supplementary material, which is available to authorized users.
机译:利用扫描电子显微镜(SEM)和高分辨率透射电子显微镜(HRTEM)系统研究了通过两步固源化学气相沉积(CVD)方法制备的金催化的InGaAs纳米线(NWs)的形貌和微观结构。详细的结构表征和统计分析表明,在InGaAs纳米线中,两种特定的形态占主导地位,锯齿形表面形态和光滑表面形态。之字形形态是由于孪生结构的周期性存在,而平滑形态是由于缺乏孪生结构。 HRTEM图像和能量色散X射线光谱(EDX)表明,催化剂头具有两个结构Au4In和AuIn2,它们以立方相晶体形式生成InGaAs NW。 InGaAs NW的生长机理始于Au纳米颗粒熔化成小球。 In原子扩散到Au球中形成Au-In合金。当合金中In的浓度达到其饱和点时,In沉淀物会与Ga和As原子反应,在催化剂和底物之间的界面处形成InGaAs。一旦形成InGaAs化合物,仅在InGaAs与催化剂的界面处才会发生额外的沉淀和反应。这些结果提供了对InGaAs NW生长过程的基本理解,这对于形成适用于各种器件应用的高质量InGaAs NW至关重要。电子补充材料本文的在线版本(10.1186 / s11671-018-2685-0)包含补充资料,可供授权用户使用。

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