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机译:选择性金属有机化学气相沉积法嵌入GaAs纳米线中的多堆叠InGaAs量子点的形成和光学性质
NanoQUINE, The University of Tokyo, 4-6-1 Komaba, Meguro-ku, Tokyo 153-8505, Japan;
NanoQUINE, The University of Tokyo, 4-6-1 Komaba, Meguro-ku, Tokyo 153-8505, Japan;
NanoQUINE, The University of Tokyo, 4-6-1 Komaba, Meguro-ku, Tokyo 153-8505, Japan,Institute of Industrial Science, The University of Tokyo, 4-6-1 Komaba, Meguro-ku, Tokyo 153-8505, Japan;
NanoQUINE, The University of Tokyo, 4-6-1 Komaba, Meguro-ku, Tokyo 153-8505, Japan,Institute of Industrial Science, The University of Tokyo, 4-6-1 Komaba, Meguro-ku, Tokyo 153-8505, Japan;
NanoQUINE, The University of Tokyo, 4-6-1 Komaba, Meguro-ku, Tokyo 153-8505, Japan,Institute of Industrial Science, The University of Tokyo, 4-6-1 Komaba, Meguro-ku, Tokyo 153-8505, Japan;
NanoQUINE, The University of Tokyo, 4-6-1 Komaba, Meguro-ku, Tokyo 153-8505, Japan,Institute of Industrial Science, The University of Tokyo, 4-6-1 Komaba, Meguro-ku, Tokyo 153-8505, Japan;
A2. metalorganic vapor phase epitaxy; B2. semiconductorⅢ—Ⅴ materials;
机译:通过选择性金属有机化学气相沉积嵌入GaAs纳米线中的位控InGaAs量子点的光学性质
机译:中间层对金属有机化学气相沉积生长的InGaAsN / GaAs量子阱光学性能的影响
机译:三步选择区金属有机化学气相沉积法制备应变层InGaAs-GaAs-AlGaAs埋层异质结构量子阱激光器
机译:通过金属有机化学气相沉积法形成嵌入在位置控制的GaAs纳米线中的单个In(Ga)As / GaAs量子点,以应用于单光子源
机译:铝砷化镓-砷化镓-砷化镓-砷化铟量子点通过低压金属有机化学气相沉积与量子阱异质结构激光器耦合。
机译:固源两步化学气相沉积法制备InGaAs纳米线的形成机理
机译:在Gaas衬底上通过金属有机化学气相沉积生长的InGaas / InGaasp / InGap量子阱激光二极管的界面结构