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首页> 外文期刊>Journal of Crystal Growth >Formation and optical properties of multi-stack InGaAs quantum dots embedded in GaAs nanowires by selective metalorganic chemical vapor deposition
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Formation and optical properties of multi-stack InGaAs quantum dots embedded in GaAs nanowires by selective metalorganic chemical vapor deposition

机译:选择性金属有机化学气相沉积法嵌入GaAs纳米线中的多堆叠InGaAs量子点的形成和光学性质

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摘要

We report formation and optical properties of site-controlled, multi-stack InGaAs/GaAs quantum dots (QPs) embedded in GaAs nanowires (NWs) by selective metalorganic chemical vapor deposition. InGaAs/GaAs QPs are realized in GaAs NWs grown on patterned GaAs(111)B substrates in the form of InGaAs/GaAs heterostructures and identified by structural analyses and photoluminescence characterization. Optical characterization at 10 K corroborates formation of high-quality, multi-stack InGaAs/ GaAs QP-in-NWs up to 50-stack without degradation of PL intensities. In addition, light emission at room temperature from multi-stack InGaAs/GaAs QPs embedded in GaAs NWs is realized. These results would enable the realization of high-performance IBSCs based on site-controlled QP-in-NWs utilizing existing, well-established NW growth technologies on a GaAs platform.
机译:我们通过选择性金属有机化学气相沉积报告了嵌入在砷化镓纳米线(NWs)中的定点控制,多堆叠InGaAs / GaAs量子点(QP)的形成和光学性质。 InGaAs / GaAs QP在以GaAs / GaAs异质结构形式在图案化的GaAs(111)B衬底上生长的GaAs NW中实现,并通过结构分析和光致发光特性进行鉴定。 10 K的光学特性可确证形成高质量,多堆叠InGaAs / GaAs QP-in-NW直至50堆叠而不会降低PL强度。此外,还实现了嵌入GaAs NW的多堆叠InGaAs / GaAs QP在室温下的发光。这些结果将使能基于GaAs平台上现有的,成熟的NW增长技术,基于站点控制的NW的QP-in-NW的高性能IBSC。

著录项

  • 来源
    《Journal of Crystal Growth》 |2013年第1期|299-302|共4页
  • 作者单位

    NanoQUINE, The University of Tokyo, 4-6-1 Komaba, Meguro-ku, Tokyo 153-8505, Japan;

    NanoQUINE, The University of Tokyo, 4-6-1 Komaba, Meguro-ku, Tokyo 153-8505, Japan;

    NanoQUINE, The University of Tokyo, 4-6-1 Komaba, Meguro-ku, Tokyo 153-8505, Japan,Institute of Industrial Science, The University of Tokyo, 4-6-1 Komaba, Meguro-ku, Tokyo 153-8505, Japan;

    NanoQUINE, The University of Tokyo, 4-6-1 Komaba, Meguro-ku, Tokyo 153-8505, Japan,Institute of Industrial Science, The University of Tokyo, 4-6-1 Komaba, Meguro-ku, Tokyo 153-8505, Japan;

    NanoQUINE, The University of Tokyo, 4-6-1 Komaba, Meguro-ku, Tokyo 153-8505, Japan,Institute of Industrial Science, The University of Tokyo, 4-6-1 Komaba, Meguro-ku, Tokyo 153-8505, Japan;

    NanoQUINE, The University of Tokyo, 4-6-1 Komaba, Meguro-ku, Tokyo 153-8505, Japan,Institute of Industrial Science, The University of Tokyo, 4-6-1 Komaba, Meguro-ku, Tokyo 153-8505, Japan;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

    A2. metalorganic vapor phase epitaxy; B2. semiconductorⅢ—Ⅴ materials;

    机译:A2。金属有机气相外延;B2。半导体Ⅲ—Ⅴ材料;

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